2017 Fiscal Year Final Research Report
Atmospheric-pressure plasma process using high-density and high-purity water-derived reactive species produced by a water-vapor microwave plasma
Project/Area Number |
16H06859
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Research Category |
Grant-in-Aid for Research Activity Start-up
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Allocation Type | Single-year Grants |
Research Field |
Plasma electronics
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Research Institution | Nagoya University |
Principal Investigator |
SUZUKI Haruka 名古屋大学, 工学研究科, 助教 (80779356)
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Research Collaborator |
SENBA Hikaru
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Project Period (FY) |
2016-08-26 – 2018-03-31
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Keywords | 大気圧マイクロ波プラズマ / 水蒸気プラズマ / 大気遮蔽 / アッシング |
Outline of Final Research Achievements |
Atmospheric pressure plasma sources in air-shielded environment by water flow were developed for plasma process utilizing water-derived reactive species without air contamination in the atmosphere. A microwave-excited water-vapor plasma source in a space shielded by cone-shaped water flow was developed using a coaxial waveguide with a ring-shaped slot to use high-density hydroxyl radical without air contamination at atmospheric pressure. Water vapor plasma without the air was successfully realized by the pulsed microwave discharges. Production of hydroxyl radical was confirmed from the optical emission from the plasma. As an application example of the water-vapor plasma in the air shield environment, atmospheric pressure photoresist removal treatment was demonstrated.
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Free Research Field |
プラズマエレクトロニクス
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