2017 Fiscal Year Final Research Report
Multilayer-mirror objective for diffraction-limited focusing in extreme ultraviolet region
| Project/Area Number |
16K13693
|
|---|
| Research Category |
Grant-in-Aid for Challenging Exploratory Research
|
| Allocation Type | Multi-year Fund |
|---|
| Research Field |
Optical engineering, Photon science
|
|---|
| Research Institution | Tohoku University |
|---|
Principal Investigator |
|
|---|
| Co-Investigator(Kenkyū-buntansha) |
高橋 栄治 国立研究開発法人理化学研究所, 光量子工学研究領域, 専任研究員 (80360577)
|
|---|
| Project Period (FY) |
2016-04-01 – 2018-03-31
|
| Keywords | 極紫外 / 多層膜ミラー / 高次高調波 / 回折限界 / 色収差 |
|---|
| Outline of Final Research Achievements |
In the extreme ultraviolet (XUV) region (10-50 nm in wavelength), advanced laser light source technology is yielding high intensity attosecond pulses, and it enables to excite nonlinear optical phenomena in the shorter wavelength region. In this research, we have developed a focusing system with XUV multilayer mirrors, which can focus higher-order harmonics with diffraction-limited spatial resolution. Firstly, we studied to design the focusing optics with large-numerical aperture to bring small focal spot bellow 100 nm in diameter. Then, we considered the chromatic dispersion of the wave front due to the interference effect on the multilayer mirrors (chromatic aberration), and proposed novel analytical model to correct this chromatic effects. Finally, we fabricated the XUV multilayer mirrors with the achromatic optical design. Magnetron sputtering method was applied to curved-mirror substrates, and the focusing optical system without the chromatic effects was demonstrated.
|
| Free Research Field |
軟X線光学・応用光学
|
