Development of ion-assisted surface diffusion polishing method to flatten diamond surfaces in atomic level

2017 Fiscal Year Final Research Report

• Project/Area Number: 16K14124
• Research Category: Grant-in-Aid for Challenging Exploratory Research
• Allocation Type: Multi-year Fund
• Research Field: Production engineering/Processing studies
• Research Institution: Tohoku University
• Principal Investigator: Ogawa Shuichi 東北大学, 多元物質科学研究所, 助教 (00579203)
• Co-Investigator(Renkei-kenkyūsha): TAKAKUWA YUJI 東北大学, 多元物質科学研究所, 教授 (20154768)
• Research Collaborator: AJIA SAIJIAN ; SUGIMOTO RINTARO ; HASHIMOTO SUSUMU
• Project Period (FY): 2016-04-01 – 2018-03-31
• Keywords: 光電子制御プラズマ / 表面平坦化 / 精密加工 / ダイヤモンド / 低エネルギーイオンビーム

Outline of Final Research Achievements

In order to planarize the diamond surface at atomic scale, we investigated the mechanism of low energy ion beam generation using a photoemission-assisted plasma ion source. It was found that photoelectrons are more likely to be emitted by adsorption of hydrogen on the diamond surface and a low energy ion beam suitable for surface planarization can be generated. In addition, instead of expensive diamond substrates, planarization demonstration experiments using inexpensive diamond like carbon (DLC) film was carried out, and the growth mechanism of DLC was clarified.

Free Research Field

表面工学