Femtosecond Pulse Radiolysis Study on Nanoscale Time Space Reaction Process

Products Report

• Project/Area Number: 17106014
• Research Category: Grant-in-Aid for Scientific Research (S)
• Allocation Type: Single-year Grants
• Research Field: Nuclear engineering
• Research Institution: Osaka University
• Principal Investigator: TAGAWA Seiichi Osaka University, 産業科学研究所, 教授 (80011203)
• Co-Investigator(Kenkyū-buntansha): KOZAWA Takahiro 大阪大学, 産業科学研究所, 准教授 (20251374) ; SEKI Shuhei 大阪大学, 工学研究科, 准教授 (30273709) ; SAEKI Akinori 大阪大学, 産業科学研究所, 助教 (10362625) ; OKAMOTO Kazumasa 大阪大学, 産業科学研究所, 特任助教 (10437353) ; YAMAMOTO Hiroki 大阪大学, 産業科学研究所, 特任助教 (00516958)
• Project Period (FY): 2005 – 2008

Research Products

• [Journal Article] Dependence of Acid Generation Efficiency on Molecular Structures of Acid Generators upon Exposure to Extreme Ultraviolet Radiation (2008)
  • Author(s): R. Hirose, T. Kozawa, S. Tagawa, T. Kai, T. Shimokawa
  • Journal Title: Appl. Phys. Express Volume: 1 Pages: 027004
  • Peer Reviewed
• [Journal Article] Difference in Reaction Schemes in Photolysis of Triphenylsulfonium Salts between 248 nm and Dry/Wet 193 nm Resists (2008)
  • Author(s): Y. Matsui, H. Sugawara, S. Seki, T. Kozawa, S. Tagawa, T. Itani
  • Journal Title: Appl. Phys. Express Volume: 1 Pages: 036001
  • Peer Reviewed
• [Journal Article] Resolution degradation caused by multispur effect in chemically amplified extreme ultraviolet resists (2008)
  • Author(s): T. Kozawa, S. Tagawa, M. Shell
  • Journal Title: J. Appl. Phys. Volume: 103 Pages: 084306
  • Peer Reviewed
• [Journal Article] Feasibility Study of Chemically Amplified Extreme Ultraviolet Resists for 22 nm Fabrication (2008)
  • Author(s): T. Kozawa, S. Tagawa, J. J. Santillan, M. Toriumi, T. Itani
  • Journal Title: Jpn. J. Appl. Phys. Volume: 47 Pages: 4465-4468
  • Peer Reviewed
• [Journal Article] Effects of Rate Constant for Deprotection on Latent Image Formation in Chemically Amplified Extreme Ultraviolet Resists (2008)
  • Author(s): T. Kozawa, S. Tagawa, J. J. Santillan, M. Toriumi, T. Itani
  • Journal Title: Jpn. J. Appl. Phys. Volume: 47 Pages: 4926-4931
  • Peer Reviewed
• [Journal Article] Study of the Reaction of Acid Generators with Epithermal and Thermalized Electrons (2008)
  • Author(s): K. Natsuda, T. Kozawa, A. Saeki, S. Tagawa, T. Kai, T. Shimokawa
  • Journal Title: Jpn. J. Appl. Phys. Volume: 47 Pages: 4932-4935
  • Peer Reviewed
• [Journal Article] Latent image formation in chemically amplified extreme ultraviolet resists with low activation energy for deprotection reaction (2008)
  • Author(s): T. Kozawa, S. Tagawa J. J. Santillan, T. Itani
  • Journal Title: J. Vac. Sci. Technol. B Volume: 26 Pages: 2257-2260
  • Peer Reviewed
• [Journal Article] Dependence of Absorption Coefficient and Acid Generation Efficiency on Acid Generator Concentration in Chemically Amplified Resist for Extreme Ultraviolet Lithography (2007)
  • Author(s): R. Hirose, T. Kozawa, S. Tagawa, T. Kai, T. Shimokawa
  • Journal Title: Jpn. J. Appl. Phys. Volume: 46 Pages: L979-L981
  • Peer Reviewed
• [Journal Article] Study of Acid-Base Equilibrium in Chemically Amplified Resist (2007)
  • Author(s): K. Natsuda, T. Kozawa, K. Okamoto, S. Tagawa
  • Journal Title: Jpn. J. Appl. Phys. Volume: 46 Pages: 7285-7289
  • Peer Reviewed
• [Journal Article] Theoretical Study on Relationship between Acid Generation Efficiency and Acid Generator Concentration in Chemically Amplified Extreme Ultraviolet Resists (2007)
  • Author(s): T. Kozawa, S. Tagawa, M. Shell
  • Journal Title: Jpn. J. Appl. Phys. Volume: 46 Pages: L1143-L1145
  • Peer Reviewed
• [Journal Article] Point Spread Function for the Calculation of Acid Distribution in Chemically Amplified Resists Used for Electron-Beam Lithography (2007)
  • Author(s): T. Kozawa, S. Tagawa
  • Journal Title: Jpn. J. Appl. Phys. Volume: 46 Pages: L1200-L1202
  • Peer Reviewed
• [Journal Article] Image contrast slope and line edge roughness of chemically amplified resists for postoptical lithography (2007)
  • Author(s): T. Kozawa, S. Tagawa, J. J. Santillan, M. Toriumi, T. Itani
  • Journal Title: J. Vac. Sci. Technol. B Volume: 25 Pages: 2295-2300
  • Peer Reviewed
• [Journal Article] Acid distribution in chemically amplified extreme ultraviolet resist (2007)
  • Author(s): T. Kozawa, S. Tagawa, H. B. Cao, H. Deng, M. J. Leeson
  • Journal Title: J. Vac. Sci. Technol. B Volume: 25 Pages: 2481-2485
  • Peer Reviewed
• [Journal Article] Polymer structure dependence of acid generation in chemically amplified extreme ultraviolet resists (2007)
  • Author(s): H. Yamamoto, T. Kozawa, S. Tagawa, H. B. Cao, H. Deng, M. J. Leeson
  • Journal Title: Jpn. J. Appl. Phys. Volume: 46 Pages: L142-L144
  • Peer Reviewed
• [Journal Article] Analysis of Acid Yield Generated in Chemically Amplified Electron Beam Resist (2006)
  • Author(s): T. Kozawa, T. Shigaki, K. Okamoto, A. Saeki, S. Tagawa, T. Kai, T. Shimokawa
  • Journal Title: J. Vac. Sci. Technol. B Volume: 24 Pages: 3055-3060
  • Peer Reviewed
• [Journal Article] Acid generation efficiency in a model system of chemically amplified extreme ultraviolet resist (2006)
  • Author(s): T. Kozawa, S. Tagawa, H. Oizumi, I. Nishiyama
  • Journal Title: J. Vac. Sci. Technol. B Volume: 24 Pages: L27-L30
  • Peer Reviewed
• [Journal Article] Correlation between proton dynamics and line edge roughness in chemically amplified resist for post-optical lithography (2006)
  • Author(s): A. Saeki, T. Kozawa, S. Tagawa, H. B. Cao
  • Journal Title: J. Vac. Sci. Technol. B Volume: 24 Pages: 3066-3072
  • Peer Reviewed
• [Journal Article] Acid Generation Mechanism of Poly (4-hydroxystyrene) -Based Chemically Amplified Resists for Post-Optical Lithography : Acid Yield and Deprotonation Behavior of Poly (4-hydroxystyrene) and Poly (4-methoxystyrene) (2006)
  • Author(s): A. Nakano, T. Kozawa, K. Okamoto, S. Tagawa, T. Kai, T. Shimokawa
  • Journal Title: Jpn. J. Appl. Phys. Volume: 45 Pages: 6866-6871
  • Peer Reviewed
• [Journal Article] Relationship between Acid Generator Concentration and Acid Yield in Chemically Amplified Electron Beam Resist (2006)
  • Author(s): T. Shigaki, K. Okamoto, T. Kozawa, H. Yamamoto, S. Tagawa, T. Kai, T. Shimokawa
  • Journal Title: Jpn. J. Appl. Phys. Volume: 45 Pages: 5735-5737
  • Peer Reviewed
• [Journal Article] Reaction mechanism of fluorinated chemically amplified resists (2006)
  • Author(s): H. Yamamoto, T. Kozawa, K. Okamoto, A. Saeki, S. Tagawa, T. Ando, M. Sato, H. Komano
  • Journal Title: J. Vac. Sci. Technol. B Volume: 24 Pages: 1833-1836
  • Peer Reviewed
• [Journal Article] Pulse radiolysis based on a femtosecond electron beam and a femtosecond laser light with double-pulse injection technique (2006)
  • Author(s): J. Yang, T. Kondoh, T. Kozawa, Y. Yoshida, S. Tagawa
  • Journal Title: Radiat. Phys. Chem. Volume: 75 Pages: 1034-1040
  • Peer Reviewed
• [Journal Article] Line edge roughness of a latent image in post-optical lithography (2006)
  • Author(s): A. Saeki, T. Kozawa, S. Tagawa, H. B. Cao
  • Journal Title: Nanotechnology Volume: 17 Pages: 1543-1546
  • Peer Reviewed
• [Journal Article] Reactivity of Acid Generators for Chemically Amplified Resists with Low-Energy Electrons (2006)
  • Author(s): A. Nakano, T. Kozawa, S. Tagawa, T. Szreder, J. F. Wishart, T. Kai, T. Shimokawa
  • Journal Title: Jpn. J. Appl. Phys. Volume: 45 Pages: L197-L200
  • Peer Reviewed
• [Journal Article] Femtosecond single electron bunch generation by rotating longitudinal bunch phase space in magnetic field (2006)
  • Author(s): J. Yang, T. Kondoh, K. Kan, T. Kozawa, Y. Yoshida, S. Tagawa
  • Journal Title: Nucl. Instrum. Meth. A Volume: 556 Pages: 52-56
  • Peer Reviewed
• [Journal Article] Reaction Mechanisms of Brominated Chemically Amplified Resists (2005)
  • Author(s): H. Yamamoto, T. Kozawa, A. Nakano, S. Tagawa, T. Ando, M. Sato, H. Komano
  • Journal Title: Jpn. J. Appl. Phys. Volume: 44 Pages: L842-L844
  • Peer Reviewed
• [Journal Article] Requirements for Laser-Induced Desorption/Ionization on Submicrometer Structures (2005)
  • Author(s): S. Okuno, R. Arakawa, K. Okamoto, Y. Matsui, S. Seki, T. Kozawa, S. Tagawa, Y. Wada
  • Journal Title: Anal. Chem. Volume: 77 Pages: 5364-5369
  • Peer Reviewed
• [Journal Article] Study on acid generation from polymer (2005)
  • Author(s): H. Yamamoto, T. Kozawa, A. Nakano, K. Okamoto, S. Tagawa, T. Ando, M. Sato, H. Komano
  • Journal Title: J. Vac. Sci. Technol. B Volume: 23 Pages: 2728-2732
  • Peer Reviewed
• [Journal Article] Dependence of Acid Yield on Acid Generator in Chemically Amplified Resist for Post-Optical Lithography (2005)
  • Author(s): A. Nakano, K. Okamoto, Y. Yamamoto, T. Kozawa, S. Tagawa, T. Kai, H. Nemoto
  • Journal Title: Jpn. J. Appl. Phys. Volume: 44 Pages: 5832-5835
  • Peer Reviewed
• [Journal Article] Potential Cause of Inhomogeneous Acid Distribution in Chemically Amplified Resists for Post Optical Lithography (2005)
  • Author(s): H. Yamamoto, T. Kozawa, A. Nakano, K. Okamoto, S. Tagawa, T. Ando, M. Sato, H. Komano
  • Journal Title: Jpn. J. Appl. Phys. Volume: 44 Pages: 5836-5838
  • Peer Reviewed
• [Presentation] Nanoscale Distribution of Intermediates in Resist Materials for Next Generation Lithography (2007)
  • Author(s): T. Kozawa, and S. Tagawa
  • Organizer: ASR Symposium
  • Place of Presentation: Ibaraki, Japan
  • Year and Date: 2007-11-06 – 2007-11-09
• [Presentation] Dependence of Absorption Coefficient and Acid Generation Efficiency on Acid Generator Concentration in Chemically Amplified EUV Resist (2007)
  • Author(s): R. Hirose, T. Kozawa, S. Tagawa, T. Kai and T. Shimokawa
  • Organizer: Microprocess and Nanotechnology Conference
  • Place of Presentation: Kyoto, Japan
  • Year and Date: 2007-11-05 – 2007-11-08
• [Presentation] Effect of Fluorine Atom on Acid Generation in Chemically Amplified EUV Resist (2007)
  • Author(s): H. Yamamoto, T. Kozawa, S. Tagawa, H. Yukawa, M. Sato, J. Onodera
  • Organizer: Microprocess and Nanotechnology Conference
  • Place of Presentation: Kyoto, Japan
  • Year and Date: 2007-11-05 – 2007-11-08
• [Presentation] Study on the Reaction of Acid Generators with Epithermal Electrons (2007)
  • Author(s): K. Natsuda, T. Kozawa, A. Saeki, S. Tagawa, T. Kai, T. Shimokawa
  • Organizer: Microprocess and Nanotechnology Conference
  • Place of Presentation: Kyoto, Japan
  • Year and Date: 2007-11-05 – 2007-11-08
• [Presentation] Effects of rate constant for deprotection reaction on latent image formation in chemically amplified EUV resists (2007)
  • Author(s): T. Kozawa, S. Tagawa, J. J. Santillan, M. Toriumi, and T. Itani
  • Organizer: Microprocess and Nanotechnology Conference
  • Place of Presentation: Kyoto, Japan
  • Year and Date: 2007-11-05 – 2007-11-08
• [Presentation] Depth profile of acid generator distribution in chemically amplified resists (2007)
  • Author(s): T. Fukuyama, T. Kozawa, S. Tagawa, R. Takasu, H. Yukawa, M. Sato, J. Onodera, I. Hirosawa, T. Koganesawa, K. Horie
  • Organizer: Microprocess and Nanotechnology Conference
  • Place of Presentation: Kyoto, Japan
  • Year and Date: 2007-11-05 – 2007-11-08
• [Presentation] Effect of Fluorine Atom on Acid Generation in Chemically Amplified EUV Resist (2007)
  • Author(s): H. Yamamoto, T. Kozawa, S. Tagawa H. Yukawa, M. Sato, H. Komano
  • Organizer: 2007 International EUVL Symposium
  • Place of Presentation: Sapporo, Japan
  • Year and Date: 2007-10-28 – 2007-10-31
• [Presentation] Effects of activation energy for deprotection reaction on latent image contrast (2007)
  • Author(s): T. Kozawa, A. Saeki, S. Tagawa, J. J. Santillan, M. Toriumi, T. Itani
  • Organizer: 2007 International EUVL Symposium
  • Place of Presentation: Sapporo, Japan
  • Year and Date: 2007-10-28 – 2007-10-31
• [Presentation] Pulse radiolysis of polystyrene and derivatives (2007)
  • Author(s): K. Okamoto, M. Tanaka, T. Kozawa, S. Seki, S. Tagawa
  • Organizer: 13th International Congress of Radiation Research
  • Place of Presentation: San Francisco, California, USA
  • Year and Date: 2007-07-07 – 2007-07-13
• [Presentation] High precision measurement of higher diffraction-order contamination in monochromatized soft X-ray by using a compact transmission-grating spectrometer (2007)
  • Author(s): K. Fukui, T. Sakai, T. Hatsui, N. Kosugi, Y. Hamamura, K. Okamoto, Y. Matsui, T. Kozawa, S. Seki, S. Tagawa
  • Organizer: International Conference on Vacuum Ultraviolet Radiation Physics 15th
  • Place of Presentation: Berlin, Germany
  • Year and Date: 2007-06-29 – 2007-07-03
• [Presentation] Development and performance of quasi-free standing transmission-grating for soft X-ray emission spectrometer (2007)
  • Author(s): T. Hatsui, K. Okamoto, Y. Matsui, T. Kozawa, S. Seki, S. Tagawa, Y. Hamamura, N. Kosugi
  • Organizer: International Conference on Vacuum Ultraviolet Radiation Physics 15th
  • Place of Presentation: Berlin, Germany
  • Year and Date: 2007-06-29 – 2007-07-03
• [Presentation] Study on dynamics of radical ions of polystyrenes by pulse radiolysis (2007)
  • Author(s): K. Okamoto, M. Tanaka, S. Seki, T. Kozawa, S. Tagawa
  • Organizer: 13th International Congress of Radiation Research
  • Place of Presentation: San Francisco, California, USA
  • Year and Date: 2007-06-07 – 2007-06-13
• [Presentation] Acid distribution in chemically amplified extreme ultraviolet resist (2007)
  • Author(s): T. Kozawa, S. Tagawa, H. B. Cao, H. Deng, M. J. Leeson
  • Organizer: The fifty-first international conference on electron, ion, and photon beam technology and nanofabrication (51st EIPBN)
  • Place of Presentation: Denver, Colorado, USA
  • Year and Date: 2007-05-29 – 2007-06-01
• [Presentation] Image Contrast Slope and Line Edge Roughness of Chemically Amplified Resists for Post-Optical Lithography (2007)
  • Author(s): T. Kozawa, S. Tagawa, J. J. Santillan, M. Toriumi, T. Itani
  • Organizer: The fifty-first international conference on electron, ion, and photon beam technology and nanofabrication (51st EIPBN)
  • Place of Presentation: Denver, Colorado, USA
  • Year and Date: 2007-05-29 – 2007-06-01
• [Presentation] Single-Component Chemically Amplified Resist Based on Dehalogenation of Polymer (2007)
  • Author(s): H. Yamamoto, T. Kozawa, S. Tagawa, K. Ohmori, M. Sato, H. Komano
  • Organizer: SPIE Advanced Microlithography
  • Place of Presentation: San Jose, California, USA
  • Year and Date: 2007-02-25 – 2007-03-02
• [Presentation] Study on photochemical analysis system for EUV lithography (2007)
  • Author(s): A. Sekiguchi, Y. Kono, M. Kadoi, Y. Minami, T. Kozawa, S. Tagawa, D. Gustafson, P. Plackborow
  • Organizer: SPIE Advanced Microlithography
  • Place of Presentation: San Jose, California, USA
  • Year and Date: 2007-02-25 – 2007-03-02
• [Presentation] Effect of Acid Diffusion and Polymer Structure on Line Edge Roughness (2006)
  • Author(s): H. Yamamoto, T. Kozawa, A. Saeki, K. Okamoto, S. Tagawa, K. Ohmori, M. Sato, H. Komano
  • Organizer: Int. Microprocesses and Nanotechnology Conf.
  • Place of Presentation: Kamakura, Japan
  • Year and Date: 2006-10-25 – 2006-10-27
• [Presentation] Proton Dynamics and Amines in Chemically Amplified Resist (2006)
  • Author(s): K. Natsuda, T. Kozawa, K. Okamoto, S. Tagawa
  • Organizer: Int. Microprocesses and Nanotechnology Conf.
  • Place of Presentation: Kamakura, Japan
  • Year and Date: 2006-10-25 – 2006-10-27
• [Presentation] Line edge roughness in chemically amplified resist of electron beam lithography (2006)
  • Author(s): A. Saeki, T. Kozawa, S. Tagawa and H. B. Cao
  • Organizer: 50th EIPBN
  • Place of Presentation: Baltimore, Maryland, USA
  • Year and Date: 2006-05-30 – 2006-06-02
• [Presentation] Analysis of Acid Yield Generated in Chemically Amplified Electron Beam Resist (2006)
  • Author(s): T. Kozawa, T. Shigaki, K. Okamoto, A. Saeki and S. Tagawa
  • Organizer: 50th EIPBN
  • Place of Presentation: Baltimore, Maryland, USA
  • Year and Date: 2006-05-30 – 2006-06-02
• [Presentation] Difference between initial distributions of proton and counter anion in chemically amplified electron-beam resist (2006)
  • Author(s): T. Kozawa, H. Yamamoto, A. Saeki and S. Tagawa
  • Organizer: 31st Int. Symp. Microlithography
  • Place of Presentation: San Jose, California, USA
  • Year and Date: 2006-02-19 – 2006-02-24
• [Presentation] The reaction mechanism of poly[4-hydroxystyrene-co-4-(1, 1, 1, 3, 3, 3-hexafluoro-2- hydroxypropyl)-styrene] (2006)
  • Author(s): H. Yamamoto, T. Kozawa, K. Okamoto, S. Tagawa, T. Ando, M. Sato, H. Komano
  • Organizer: 31st Int. Symp. Microlithography
  • Place of Presentation: San Jose, California, USA
  • Year and Date: 2006-02-19 – 2006-02-24