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2008 Fiscal Year Final Research Report

Femtosecond Pulse Radiolysis Study on Nanoscale Time Space Reaction Process

Research Project

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Project/Area Number 17106014
Research Category

Grant-in-Aid for Scientific Research (S)

Allocation TypeSingle-year Grants
Research Field Nuclear engineering
Research InstitutionOsaka University

Principal Investigator

TAGAWA Seiichi  Osaka University, 産業科学研究所, 教授 (80011203)

Co-Investigator(Kenkyū-buntansha) KOZAWA Takahiro  大阪大学, 産業科学研究所, 准教授 (20251374)
SEKI Shuhei  大阪大学, 工学研究科, 准教授 (30273709)
SAEKI Akinori  大阪大学, 産業科学研究所, 助教 (10362625)
OKAMOTO Kazumasa  大阪大学, 産業科学研究所, 特任助教 (10437353)
YAMAMOTO Hiroki  大阪大学, 産業科学研究所, 特任助教 (00516958)
Project Period (FY) 2005 – 2008
Keywordsフェムト秒パルスラジオリシス / ナノ時空間反応 / 量子ビーム / ナノテクノロジー
Research Abstract

本研究は量子ビームがナノ空間に誘起する化学反応を、エネルギー付与過程から中間活性種の初期空間分布と空間分布の時間変化を含め解明することにより、将来、ナノ空間に誘起される現象を、次世代リソグラフィやナノリソグラフィにおいて使いこなすための基礎過程を確立することを目的とした研究である

  • Research Products

    (17 results)

All 2009 2008 2007 2006 2005

All Journal Article (8 results) (of which Peer Reviewed: 8 results) Presentation (9 results)

  • [Journal Article] Formation of Intramolecular Poly(4-hydroxystyrene) Dimer Radical Cation2008

    • Author(s)
      K. Okamoto, T. Kozawa, K. Natsuda, S. Seki, and S. Tagawa
    • Journal Title

      J. Phys. Chem B 112

      Pages: 9275-9280

    • Peer Reviewed
  • [Journal Article] Stroboscopic picosecond pulse radiolysis using near-ultraviolet-enhanced femtosecond continuum generated by CaF22007

    • Author(s)
      A. Saeki, T. Kozawa, K. Okamoto, and S. Tagawa
    • Journal Title

      Jpn. J. Appl. Phys 46

      Pages: 407-411

    • Peer Reviewed
  • [Journal Article] Subpicosecond pulse radiolysis in liquid methyl-substituted benzene derivatives, Radiat2007

    • Author(s)
      K. Okamoto, T. Kozawa, A. Saeki, Y. Yoshida, and S. Tagawa
    • Journal Title

      Phys. Chem 76

      Pages: 818-826

    • Peer Reviewed
  • [Journal Article] Reactivity between Biphenyl and Precursor of Solvated Electrons in Tetrahydrofuran Measured by Picosecond Pulse Radiolysis in Near-ultraviolet, Visible, and Infrared2007

    • Author(s)
      A. Saeki, T. Kozawa, Y. Ohnishi, and S. Tagawa
    • Journal Title

      Reactivity between Biphenyl and Precursor of Solvated Electrons in Tetrahydrofuran Measured by Picosecond Pulse Radiolysis in Near-ultraviolet, Visible, and Infrared A 111

      Pages: 1229-1235

    • Peer Reviewed
  • [Journal Article] Protonation sites in chemically amplified resists for electron beam lithography Jpn2006

    • Author(s)
      K. Natsuda, T. Kozawa, K. Okamoto and S. Tagawa
    • Journal Title

      J. Appl. Phys 45

      Pages: L1256-L1258

    • Peer Reviewed
  • [Journal Article] Resolution blur of latent acid image and acid generation efficiency of chemically amplified resists for electron beam lithography2006

    • Author(s)
      T. Kozawa and S. Tagawa
    • Journal Title

      J. Appl. Phys 99

      Pages: 054509

    • Peer Reviewed
  • [Journal Article] Picosecond pulse radiolysis using femtosecond white light with a high S/N spectrum acquisition system in one beam shot, Nucl2006

    • Author(s)
      A. Saeki, T. Kozawa, and S. Tagawa
    • Journal Title

      Instrum. Meth A 556

      Pages: 391-396

    • Peer Reviewed
  • [Journal Article] Proton and anion distribution and line edge roughness of chemically amplified electron beam resist2005

    • Author(s)
      T. Kozawa, H. Yamamoto, A. Saeki, and S. Tagawa
    • Journal Title

      J. Vac. Sci. Technol B23

      Pages: 2716-2720

    • Peer Reviewed
  • [Presentation] Sensitization mechanisms of chemically amplified resists and resist design for 22 nm node2009

    • Author(s)
      T. Kozawa and S. Tagawa
    • Organizer
      2009 International Workshop on EUV Lithography
    • Place of Presentation
      Oahu, Hawaii, USA
    • Year and Date
      20090713-17
  • [Presentation] Study on acid generation of acid generators in chemically amplified resists for electron beam2008

    • Author(s)
      K. Natsuda, T. Kozawa, K. Okamoto, and S. Tagawa
    • Organizer
      International Workshop on Molecular Information and Dynamics 2008
    • Place of Presentation
      Taipei, Taiwan
    • Year and Date
      20081210-12
  • [Presentation] Dynamics of Radical Cation of Poly(4-Hydroxystyrene)and its Copolymer2008

    • Author(s)
      K. Okamoto, M. Tanaka, T. Kozawa, S. Tagawa
    • Organizer
      21st International Microprocesses and Nanotechnology Conference
    • Place of Presentation
      Fukuoka, Japan
    • Year and Date
      20081027-30
  • [Presentation] Horie, Effect of acid generator structure on its depth distribution in chemically amplified resist films2008

    • Author(s)
      T. Fukuyama, T. Kozawa, K. Okamoto, S. Tagawa, M. Irie, T. Mimura, T. Iwai, J. Onodera, I. Hirosawa, T. Koganesawa, and K
    • Organizer
      21st International Microprocesses and Nanotechnology Conference
    • Place of Presentation
      Fukuoka, Japan
    • Year and Date
      20081027-30
  • [Presentation] Study on Reactivity of Halogenated Resist Polymer with Low-Energy Electrons2008

    • Author(s)
      H. Yamamoto, T. Kozawa, A. Saeki, S. Tagawa, T. Mimura, H. Yukawa, and J. Onodera
    • Organizer
      21st International Microprocesses and Nanotechnology Conference
    • Place of Presentation
      Fukuoka, Japan
    • Year and Date
      20081027-30
  • [Presentation] Effect of molecular structures of acid generators on acid generation in chemically amplified resists upon exposure to 75 keV electron beam2008

    • Author(s)
      K. Natsuda, T. Kozawa, K. Okamoto, and S. Tagawa
    • Organizer
      21st International Microprocesses and Nanotechnology Conference
    • Place of Presentation
      Fukuoka, Japan
    • Year and Date
      20081027-30
  • [Presentation] Dynamics of Radical Cations of Resist Model Compounds2008

    • Author(s)
      K. Okamoto, M. Tanaka, T. Kozawa, S. Tagawa
    • Organizer
      2nd Asia-Pacific Symposium on Radiation Chemistry
    • Place of Presentation
      Waseda University
    • Year and Date
      20080829-0901
  • [Presentation] Dependence of Acid Generation Efficiency on Molecular Structure and Concentration of Acid Generator in Chemically Amplified EUV Resist, SPIE Advanced Lithography2008

    • Author(s)
      R. Hirose, T. Kozawa, S. Tagawa, T. Kai, and T. Shimokawa
    • Organizer
      San Jose
    • Place of Presentation
      California, USA
    • Year and Date
      20080225-0301
  • [Presentation] Acid-base equilibrium in chemically amplified resist, SPIE Advanced Lithography2008

    • Author(s)
      K. Natsuda, T. Kozawa, K. Okamoto, and S. Tagawa
    • Organizer
      San Jose
    • Place of Presentation
      California, USA
    • Year and Date
      20080225-0301

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Published: 2010-06-10   Modified: 2016-04-21  

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