2007 Fiscal Year Final Research Report Summary
Novel semiconductors with controlled both single-atom number and position
| Project/Area Number |
17201026
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| Research Category |
Grant-in-Aid for Scientific Research (A)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Nanomaterials/Nanobioscience
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| Research Institution | Waseda University |
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Principal Investigator |
ODOMARI Iwao Waseda University, Faculty of Science and Engineering, Professor (30063720)
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| Co-Investigator(Kenkyū-buntansha) |
HORIKOSHI Yoshiji Waseda University, Faculty of Science and Engineering, Professor (60287985)
SHINADA Takahiro Consolidated Research Institute for Advanced Science and Medical Care, 先端科学・健康医療融合研究機構, Associate Professor (30329099)
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| Project Period (FY) |
2005 – 2007
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| Keywords | Single ion implantation / Semiconductor / Silicon / Impurity atom / Radom dopant fluctuation / Ordered dopant array / Impurity doping / Transistor |
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| Research Abstract |
Doping of impurity atoms into semiconductors is essential to achieving the proper function of semiconductor devices. So far the semiconductor has been assumed to be homogeneously doped in the active channel region. In the nano-scale semiconductor devices, however, the channel region will contain few dopant atoms and the assumption of uniform dopant distribution is no longer feasible. In this situation, the statistical fluctuation in dopant atom number due to random Poisson distribution will elicit deleterious effects on the device's functioning. We have been developing a single-ion implantation(SII) method that enables us to implant dopant ions one-by-one into semiconductors until the desired number is reached In this study, we have improved the beam diameter approximately 10nm by modifying the focused ion beam optics for the SII and achieved the single-ion detection efficiency 100% by detecting the change in drain-current induced by single-ion incidence. We have then fabricated semico
… More
nductor devices with ordered dopant arrays by the SII. Electrical measurements of the resulting transistors revealed that there are fewer device-to-device fluctuations in the threshold voltage (V_<th> ; the turn-on voltage of the device) of the devices with ordered dopant arrays than of those with conventional randomly doped distribution. We also found that the average value of V_<th> for the devices with ordered dopants is two times lower than that of the devices with a random distribution of dopants. We explain this pronounced difference in threshold voltage as follows : the uniformity of electrostatic potential lowers the voltage required to open the channel from source to drain, which allows for early turn-on in those parts of the channel that correspond to the positioning of the implanted ions and results in the lower threshold voltage. It must be noted that current technology, which is based on random distribution of ions, cannot control either the number or the positioning of the ions, while our method can control both the number and the positioning of the ions and that this control is essential for future nanoscale semiconductor devices. Less
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[Presentation] Be and Mg co-doping in GaN2006
Author(s)
A. Kawaharazuka, T. Tanimoto, K. Nagai, Y. Tanaka, Y. Horikoshi
Organizer
The 14th International Conference on Molecular Beam Epitaxy
Place of Presentation
Tokyo, Japan
Year and Date
20060903-08
Description
「研究成果報告書概要(欧文)」より
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[Presentation] Semiconductor properties of B implantation diamond with FIB2006
Author(s)
T. Koide, S. Mejima, K. Hirma, N. Tubouchi, M. Ogura, A. Chayahara, S. Shikata, T. Shinada, I. Ohodomari, H. Kawarada
Organizer
The 67th Autumn meeting of Japan Society of Applied Physics and Related Societies
Place of Presentation
Ritsumeikan University
Year and Date
20060800
Description
「研究成果報告書概要(欧文)」より
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[Presentation] Real-time detection of single ion implantation2005
Author(s)
T. Kobayashi, T. Shinada, S.Okamoto, T Kurosawa, H. Nakayama, I. Ohdomari
Organizer
The 66th Autumn meeting of Japan Society of Applied Physics and Related Societies
Place of Presentation
The University of Tokushima
Year and Date
20050900
Description
「研究成果報告書概要(欧文)」より
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[Presentation] Electrical characteristics of Al-doped C_60 layers2005
Author(s)
F. Matsutani, J. Nishinaga, T. Aihara, T. Takada, R. Harada, T. Deguchi, Y. Horikoshi
Organizer
The 66th Autumn meeting of Japan Society of Applied Physics and Related Societies
Place of Presentation
The University of Tokushima
Year and Date
20050900
Description
「研究成果報告書概要(欧文)」より
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[Presentation] Reactions and Diffusion of Atomic and Molecular Oxygen in the SiO2 Network2005
Author(s)
K. Tatsumura, T. Shimura, E. Mishima, K. Kawamura, D. Yamasaki, H. Yamamoto, T. Watanabel, M. Umeno, I. Ohdomari
Organizer
The Eighth International Conference on Atomically Controlled Surfaces, Interfaces and Nanostructures(ACSIN 8)
Place of Presentation
Stockholm, Sweden
Year and Date
20050600
Description
「研究成果報告書概要(欧文)」より
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