2007 Fiscal Year Final Research Report Summary
Next Generation Debris-Free EUV Source using Fast Z-pinch Discharge in Cylindrical Gas Curtain
| Project/Area Number |
17206025
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| Research Category |
Grant-in-Aid for Scientific Research (A)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
電力工学・電気機器工学
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| Research Institution | Tokyo Institute of Technology |
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Principal Investigator |
HOTTA Eiki Tokyo Institute of Technology, Department of Energy Sciences, Professor (70114890)
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| Co-Investigator(Kenkyū-buntansha) |
HORIOKA Kazuhiko Tokyo Institute of Technology, Department of Energy Sciences, Professor (10126328)
OKINO Akitoshi Tokyo Institute of Technology, Department of Energy Sciences, Associate Professor (60262276)
KAWAMURA Tohru Tokyo Institute of Thchnology, Department of Energy Sciences, Lecturer (10370214)
WATANABE Masato Tokyo Institute of Technology, Department of Energy Sciences, Assistant Professor (20251663)
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| Project Period (FY) |
2005 – 2007
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| Keywords | Debris free / EUV light source / Coaxial double nozzle / Z-pinch / Gas curtain / Plasma dynamics / Diffuser / MPC circuit |
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| Research Abstract |
To develop a next generation debris-free extreme ultraviolet (EUV) source with high quality and high output power, the objectives of this study were decided as follows: 1. increase energy conversion efficiency from electrical energy storage to EUV emission, 2. suppress the debris generation, 3. develop a debris shield, which does not interfere the discharge gas flow, to mitigate the debris that cannot be removed by the above mentioned method.
Since the usual Z-pinch discharge head employs an insulating wall, debris is generated from the wall material. Therefore, in order to prevent the debris from generating, the insulating wall has been removed and the EUV has been intended to be collected in the radial direction. Using a spectrometer, suppression of debris generation was confirmed from the remarkable reduction of impurity lines. In addition, the specially designed cylindrical gas curtain was found to have a discharge gas confinement function, which was not supposed at first.
The stray
… More
inductance of the former device was very large and it was impossible to get large discharge current. Then, the circuit design was re-examined. To reduce the stray inductance in the final stage of discharge circuit as much as possible, an LC inversion generator and a two-stage magnetic pulse compression (MPC) circuit have been adopted. Experimentally obtained current has the amplitude of 22 kA and the pulse width of 260 ns for short-circuit. Moreover, to increase the conversion efficiency from the electrical input to EUV emission, a device which generates a plasma jet by using RF discharge was set.
According to the original plan, Z-pinch discharge was tried using the RF preionized plasma jet. As a result, it was found that in case of using RF preionized jet since the chamber was filled with weakly ionized plasma and discharge occurred at other place other than the plasma jet. Therefore, no Z-pinch plasma could be obtained in this case. To keep the inside of chamber high vacuum, using the turbo molecular pump to evacuate the chamber instead of using it for the diffuser, we are now trying to improve the vacuum state in the chamber. Less
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Research Products
(99 results)
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[Journal Article] Estimation of optimum density and temperature for maximum efficiency of tin ions in Z discharge extreme ultraviolet sources2007
Author(s)
Majid, Masnavi, Mitsuo, Nakajima, Eiki, Hotta, Kazuhiko, Horioka, Gohta, Niimi, Akira, Sasaki
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Journal Title
Journal of Applied Physics Vol.101, No.3, 033306
Pages: 1-9
Description
「研究成果報告書概要(欧文)」より
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[Journal Article] Absolute Measurement of EUV2007
Author(s)
Naoya, Iizuka, Nozomu, Kishi, Fei, Jiang, Akitoshi, Okino, Masato, Watanabe, Kazuhiko, Horioka, Eiki, Hotta
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Journal Title
Report on Collaborative Research, Laser Center, Osaka University
Pages: 199-200
Description
「研究成果報告書概要(欧文)」より
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[Journal Article] Ling Pulse EUV Source using Magnetically Guided Discharge Plasma2007
Author(s)
Ken, Terada, Mitsuo, Nakajima, Tohru, Kawamura, Tomoaki, Hosokai, Eiki, Hotta, Kazuhiko, Horioka
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Journal Title
IEEJ Technical Meeting on Pulsed Power Technology PPT-07-45
Pages: 41-46
Description
「研究成果報告書概要(欧文)」より
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[Journal Article] A comparative study on the performance of a xenon capillary Z-pinch EUV lithography light source using a pinhole camera2006
Author(s)
Inho, Song, Kazuhiho, Iwata, Yusuke, Homma, Smruti R, Mohanty, Masato, Watanabe, Toru, Kawamura, Akitoshi, Okino, Koichi, Yasuoka, Kazuhiko, Horioka, Eiki, Hotta
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Journal Title
Plasma Sources Science, Technology Vol.15
Pages: 322-327
Description
「研究成果報告書概要(欧文)」より
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[Journal Article] Miniature Hybrid Plasma Focus Extreme Ultraviolet Source Driven by 10 kA Current Pulse2006
Author(s)
S.R., Mohanty, T., Sakamoto, Y., Kobayashi, I., Song, M., Watanabe, T., Kawamura, A., Okino, K., Horioka, E., Hotta
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Journal Title
Review of Scientific Instruments Vol.77, No.043506
Pages: 1-7
Description
「研究成果報告書概要(欧文)」より
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[Journal Article] Performance of Gas Jet Type Z-Pinch Plasma Light Source for EUV Lithography2006
Author(s)
I., Song, Y., Kobayashi, T., Sakamoto, S., R.Mohanty, M., Watanabe, A., Okino, T., Kawamura, K., Yasuoka, K., Horioka, E., Hotta
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Journal Title
Microelectronics Engineering Vol.83
Pages: 710-713
Description
「研究成果報告書概要(欧文)」より
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[Journal Article] Absolute Measurement of EUV2006
Author(s)
Eiki, Hotta, Kazuhiko, Horioka, Akitoshi, Okino, Masato, Watanabe
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Journal Title
Report on Collaborative Research, Laser Center, Osaka University
Pages: 143-144
Description
「研究成果報告書概要(欧文)」より
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[Journal Article] Current Control of Discharge-Pumped-Plasma EUV Source2006
Author(s)
Atsushi, Kikuchi, Kensaku, Takahashi, Majid, Masnavi, Mitsuo, Nakajima, Tohru, Kawamura, Makoto, Shiho, Eiki, Hotta, Kazuhiko, Horioka
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Journal Title
The Frontiers of Pulse Power and Particle Beam Technology NIFS-PROC-64
Pages: 1-5
Description
「研究成果報告書概要(欧文)」より
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[Journal Article] Potential of discharge-based lithium plasma as an extreme ultraviolet source2006
Author(s)
Majid, Masnavi, Mitsuo, Nakajima, Akira, Sasaki, Eiki, Hotta, Kazuhiko, Horioka
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Journal Title
Applied Physics Letters Vol.89, No.3, 031503
Pages: 1-3
Description
「研究成果報告書概要(欧文)」より
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[Journal Article] Influence of electrode separation and gas curtain on extreme ultraviolet emission of a gas jet z-pinch source2006
Author(s)
Smruti R., Mohanty, Toshiro, Sakamoto, Yasunori, Kobayashi, Naoya, Iizuka, Nozomu, Kishi, Inho, Song, Masato, Watanabe, Toru, Kawamura, Akitoshi, Okino, Kazuhiko, Horioka, Eiki, Hotta
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Journal Title
Applied Physics Letters Vol.89, No.4, 041502
Pages: 1-3
Description
「研究成果報告書概要(欧文)」より
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[Journal Article] Develoment of gas jet Z-pinch extreme ultraviolet source for next generation lithography2005
Author(s)
Inho, Song, Yusuke, Honma, Kazuhiro, Iwata, S.R., Mohanty, Masato, Watanabe, Toru, Kawamura, Akitoshi, Okino, Koichi, Yasuoka, Kazuhiko, Horioka., Eiki, Hotta
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Journal Title
New Aspects of High Energy Density Plasma NIFS-PROC-61
Pages: 23-29
Description
「研究成果報告書概要(欧文)」より
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[Journal Article] Development of a Gas Jet-Type Z-Pinch EUV Light Source for Next-Generation Lithography2005
Author(s)
Inho, Song, R., Smruti, Mohanty, Masato, Watanabe, Toru, Kawamura, Akitoshi, Okino, Kazuhiko, Horioka, Eiki, Hotta
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Journal Title
Journal of Plasma Fusion Research Vol.81, No.9
Pages: 647-648
Description
「研究成果報告書概要(欧文)」より
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[Journal Article] Characteristics of Xenon Capillary Z-Pinch Extreme Ultraviolet Lithography Source Driven by Different dI/dt Discharge Current Pulses2005
Author(s)
Inho, Song, Kazuhiro, Iwata, Yusuke, Homma, Smruti, Ranjan, Mohanty, Masato, Watanabe, Toru, Kawamura, Akitoshi, Okino, Koichi, Yasuoka, Kazuhiko, Horioka, Eiki, Hotta
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Journal Title
Japanese Journal of Applied Physics Vol.44, No.12
Pages: 8640-8645
Description
「研究成果報告書概要(欧文)」より
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[Journal Article] Approach to optimize conversion efficiency of discharge-pumped plasma extreme ultraviolet sources2005
Author(s)
Majid, Masnavi, Mitsuo, Nakajima, Akira, Sasaki, Eiki, Hotta, Kazuhiko, Horioka
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Journal Title
Applied Physics Letters Vol.87, No.11, 111502
Pages: 1-4
Description
「研究成果報告書概要(欧文)」より
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