2007 Fiscal Year Final Research Report Summary
Research and Development of Novel Nano-structure Materials Prepared by(Cold Plasma/Ion-implantation) Continuous Treatment
| Project/Area Number |
17560646
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Material processing/treatments
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| Research Institution | Kitakyushu National College of Technology |
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Principal Investigator |
YAMANE Hirokazu Kitakyushu National College of Technology, Department of Materials Science and Chemical Engineering, Associate Professor (70332096)
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| Project Period (FY) |
2005 – 2007
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| Keywords | cold plasma / ion-imnlantation / nano-structure control / dye-sensitized solar cells / semiconductor electrode / surface band structure / TiO_2 / titanium dioxide |
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| Research Abstract |
Since Gratzel and coworkers developed a new type, solar cell based on the nanocrystalline TiO2 electrode sensitized to visible light with dye molecules, the goal of efficient solar cells of the next generation has focused on dye-sensitized photochemical solar cells. Dye-sensitized solar cells are most expected to be one, of the next-generation solar cells because of their simple fabrication and low-cost manufacture. In this study, in order to increase the photovoltaic conversion efficiency (η) of the dye-sensitized solar cell, the photochemical performance of the dye-sensitized solar cell comprised of the TiO_2 electrode prepared by (low-temperature plasma/ion-implantation) continuous treatment using plasma irradiation equipment and sputter ion gun Or ion implantation equipment has been, investigated. The cells comprised of the Ar plasma irradiated and N ion-implanted TiO_2 electrodes showed a higher short-circuit photocurrent density (Jac) and a larger fill factor (ff)I and higher conversion efficiency, compared with the original cell. The Jsc of the cells increased with increasing the amount of implanted N ions because the amount of oxygen vacancy in the cells increased with increasing the amount of implanted N ions, therefore, the number of conduction electrons in the cells increased. It was recognized that the performance of the cell comprised of the N ion-implanted TiO_2 electrode was influenced strongly by the amount of implanted N ions. Also, N ion-implanted and Ar plasma irradiated TiO_2 electrode showed a higher Jsc and conversion efficiency depending upon the treatment conditions. It was recognized that the performance of the cell comprised of the N ion-implanted TiO_2 electrode was influenced strongly by the conditions of plasma irradiation.
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