2019 Fiscal Year Final Research Report
A Study on Production Technology of Large-Scaled Linear Atmosheric Pressure Microwave Plasma
Project/Area Number |
17K05736
|
Research Category |
Grant-in-Aid for Scientific Research (C)
|
Allocation Type | Multi-year Fund |
Section | 一般 |
Research Field |
Plasma science
|
Research Institution | Plasma Research Laboratory Co., Ltd. |
Principal Investigator |
Shindo Haruo 株式会社プラズマ理工学研究所, 研究開発部, 教授 (20034407)
|
Co-Investigator(Kenkyū-buntansha) |
磯村 雅夫 東海大学, 工学部, 教授 (70365998)
|
Project Period (FY) |
2017-04-01 – 2020-03-31
|
Keywords | 大規模直線型マイクロ波プラズマ / 大面積プラズマ処理 / 大気圧プラズマ / 半導体プロセス / FPDプロセス |
Outline of Final Research Achievements |
In this project, development of linear microwave plasma sources at atmospheric pressure has been examined. The linear microwave plasma is quite innovative in that uniform power deposition is devised on the basis of waveguide mode of microwave. Linear microwave plasma devices at atmospheric pressure have been successfully developed as a proto-type and its application for surface treatment is studied. In the project, the following three major developments are attained; the one is that the linear microwave atmospheric-pressure plasma device of 1m length is developed. The second is that the linear microwave radiation device of 1m length is also developed as a proto-type. Thirdly the new microwave guide which enables us to control the microwave wavelength by inner conductors is developed. It is shown, further, that the development of the new microwave guide open a new road to apply the linear microwave plasma devices to various application fields.
|
Free Research Field |
プラズマ理工学
|
Academic Significance and Societal Importance of the Research Achievements |
本研究課題で得られた成果は今後12インチウエハ用半導体製造装置への応用をはじめ、ガラス表面や各種プラスチック材料の大面積表面処理に応用可能であり、各種応用分野への波及効果は大であると考える。更に新技術として開発に成功した導波管内波長の内部導体による制御技術は、より長尺の直線型プラズマ発生装置開発への道を拓くものであり、Flat Panel Display(FPD)製造分野においてG10世代へ対応可能な技術になるものと考えられる。本研究課題は(株)プラズマ理工学研究所と東海大学工学部並びに国内某大企業との共同研究による成果であることを強調するものである。
|