Development of multicharged ion beam assisted processing technology for high-speed etching of titanium micro mold

2019 Fiscal Year Final Research Report

• Project/Area Number: 17K06101
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Production engineering/Processing studies
• Research Institution: National Institute of Technology, Toyama College
• Principal Investigator: Asaji Toyohisa 富山高等専門学校, 機械システム工学科, 教授 (70574565)
• Project Period (FY): 2017-04-01 – 2020-03-31
• Keywords: イオンビーム / プラズマ / 微細加工

Outline of Final Research Achievements

The plasma etching rate of titanium plate was improved to 1 μm/min by applying a radio-frequency of 1 MHz instead of 13.56 MHz to the processing stage. We have developed a new multicharged ion beam assisted processing system consisting of an ECR ion source, a Wien filter, and a processing stage. A commercially available 1.2-GHz transceiver was adopted as a microwave source to generate the ECR plasma. The Wien filter with orthogonal electric and magnetic fields was employed as a beam separator. Ar ion beams with a current of approximately 62 μA were obtained at an extraction voltage of 4 kV. In addition, we demonstrated that Ar and Xe ions can be separated by the Wien filter. Multicharged ion beams such as Ar2+ and Xe3+ have been produced. The multicharged ion beams have improved the processing speed of silicon wafers by about 20%.

Free Research Field

イオンビーム応用

Academic Significance and Societal Importance of the Research Achievements

これまで多価イオンビームを用いた応用は国立研究所等の研究機関に限られていた．本研究で開発した小型の多価イオンビーム装置は卓上サイズで安価なため，一般の材料研究者にも使いやすい．今後の継続開発によって実用化販売も可能となる．また，イオンビーム支援加工についてはイオンビームの効果を確認することができた．今後，反応ガスの多価イオンビームを用いるなどの追加実験によって，より高速加工が可能と考えている．