2018 Fiscal Year Annual Research Report
Micro/nano-machining using metal assisted chemical etching for micro/nano systems
Project/Area Number |
17K14095
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Research Institution | Tohoku University |
Principal Investigator |
グエン・ヴァン トゥアン 東北大学, マイクロシステム融合研究開発センター, 特任助教 (30795117)
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Project Period (FY) |
2017-04-01 – 2019-03-31
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Keywords | MACE / Nano-pillars / Nanopores |
Outline of Annual Research Achievements |
This research focuses on metal-assisted chemical etching method for micro/nano device fabrication. Research achievements can be summarized, as following: 1. High aspect ratio silicon structures produced via metal assisted chemical etching and assembly technology for cantilever fabrication. 2. Cantilever with high aspect ratio nano pillars on its surface for moisture detection in electronic products. 3. Ion transportation by gating voltage to nanopores produced via metal assisted chemical etching method. 4. Low cost and high-aspect ratio micro/nano device fabrication by using innovative metal-assisted chemical etching method.
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