Micro/nano-machining using metal assisted chemical etching for micro/nano systems

2018 Fiscal Year Final Research Report

• Project/Area Number: 17K14095
• Research Category: Grant-in-Aid for Young Scientists (B)
• Allocation Type: Multi-year Fund
• Research Field: Nano/Microsystems
• Research Institution: Tohoku University
• Principal Investigator: Nguyen Van Toan 東北大学, マイクロシステム融合研究開発センター, 特任助教 (30795117)
• Project Period (FY): 2017-04-01 – 2019-03-31
• Keywords: Micro/Nano devices / Microfabication / Nanotechnology

Outline of Final Research Achievements

Research achievements can be summarized, as following: 1. High aspect ratio silicon structures produced via metal assisted chemical etching and assembly technology for cantilever fabrication. 2. Cantilever with high aspect ratio nano pillars on its surface for moisture detection in electronic products. 3. Ion transportation by gating voltage to nanopores produced via metal assisted chemical etching method. 4. Low cost and high-aspect ratio micro/nano device fabrication by using innovative metal-assisted chemical etching method.

Free Research Field

Micro/Nano devices

Academic Significance and Societal Importance of the Research Achievements

The research results have been reported in the highlight journals as well as largest conferences in Micro/Nano field.