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2009 Fiscal Year Annual Research Report

自己組織化ナノ構造形成プロセス

Research Project

Project/Area Number 18063015
Research InstitutionNara Institute of Science and Technology

Principal Investigator

浦岡 行治  Nara Institute of Science and Technology, 物質創成科学研究科, 教授 (20314536)

Co-Investigator(Kenkyū-buntansha) 山本 伸一  龍谷大学, 理工学部, 教授 (70399260)
Keywords生体超分子 / タンパク / 自己組織化 / メモリ / 半導体デバイス / 抵抗変化型メモリ / シリコン薄膜 / 低温結晶化
Research Abstract

本研究の目的は、生体超分子や有機分子など、自己組織化能力をもつ新しい材料を導入し、新しい半導体デバイスプロセスを提案することである。従来の無機材料では得られないナノメートルスケールでの均一性、位置制御性を有効に活用した、新機能デバイスプロセスの提案を行った。
(1) 自己組織化三次元構造
これまで、生体超分子の自己組織化能を利用して、2次元高密度配列を実現してきた。最終年度として、無機材料認識機能を活用して、3次元構造を作製し、電子デバイスへの応用を検討した。その結果、鉄を内包するフェリチンタンパクをシリコン酸化膜を介して3層積層し、鉄ナノドットの3次元構造を作製した。また、3次元ナノドットをシリコン酸化膜中に埋め込んだキャパシターを作製し、電子の充放電を確認した。従来の単層膜と比較して、より高いメモリ効果を確認できた。
(2) 自己組織化ナノ構造の位置制御と抵抗変化型メモリへの応用
タンパクなどのナノ構造の位置をナノスケールで制御する試みを行ってきた。本年度は、白金(Pt)を内包するフェリチンを用いて、抵抗変化型メモリへの応用を検討した。本研究では、酸化ニッケルの中に、生体超分子のPtナノドットを埋め込むことで、フィラメントの位置を制御しようとするものである。その結果、酸化ニッケル中にPtナノドットを埋め込むことで、抵抗値のばらつきを抑制できることを確認した。また、ナノドットの密度を制御することで、動作電圧を制御できることを確認した。
(3) 自己組織化ナノ材料を用いた半導体薄膜の結晶化
これまで、我々はニッケルを用いたシリコン薄膜の低温結晶化を試みてきた。本研究では、ナノドットを位置制御し、粒界の制御されたシリコン薄膜の形成を目指した。その結果、非晶質Si膜上に、パターニングされたニッケルナノ粒子の配列を確認した。また、熱処理することで、結晶粒の位置制御されたシリコン薄膜の形成を確認した。

  • Research Products

    (35 results)

All 2010 2009

All Journal Article (11 results) (of which Peer Reviewed: 11 results) Presentation (24 results)

  • [Journal Article] Effect of post thermal annealing of ZnO-TFTs by atomic layer deposition2010

    • Author(s)
      Y.Kawamura' M.Horita, Y.Uraoka
    • Journal Title

      Jpn.J.Appl.Phys 49

      Pages: 04DF19-1-6

    • Peer Reviewed
  • [Journal Article] Thin-Film Transistor Type Flash Memory with Biomineralized Co Nanodots on Silicon-on-Insulator2010

    • Author(s)
      K.Ohara, I.Yamashita, Y.Uraoka
    • Journal Title

      Jpn.J.Appl.Phys 49(accepted)

    • Peer Reviewed
  • [Journal Article] Site-directed delivery of ferritin-encapsulated fold nanoparticles2010

    • Author(s)
      N Zhen, I.Yamashita, M.Uenuma, K.Iwahori, M.Koayashi, Y.Uraoka
    • Journal Title

      Nanotechnoligy 21

      Pages: 045305

    • Peer Reviewed
  • [Journal Article] Characterization of local electrical properties of polycrystalline silicon thin films and hydrogen termination effect by conductive atomic force microscopy2009

    • Author(s)
      Emi Machida, Yukiharu Uraoka, Takashi Fuyuki, Ryohei Kokawa, Takeshi Ito, Hiroshi Ikenoue
    • Journal Title

      APPLIED PHYSICS LETTERS 94

      Pages: 182104 1-3

    • Peer Reviewed
  • [Journal Article] Floating gate memory with biomineralized nanodots embedded in High-k gate dielectric2009

    • Author(s)
      K.Ohara, I.Yamashita, T.Yaegashi, M.Moniwa, H.Yoshimaru, Y.Uraoka
    • Journal Title

      Applied hysics Express 2

      Pages: 095001 1-3

    • Peer Reviewed
  • [Journal Article] Floating Gate Memory Based on Ferritin Nanodots with High-k Gate Dielectrics2009

    • Author(s)
      K.Ohara, Y.Uraoka, T.Fuyuki, I.Yamashita, T.Yaegashi, M.Moniwa, M.Yoshimaru
    • Journal Title

      Jpn.J.Appl.Phys 48

      Pages: 04C153-1-4

    • Peer Reviewed
  • [Journal Article] Irradiatio-damages in atmospheric plasma used in a resist ashing process for thin film transitors2009

    • Author(s)
      T.Sato, A.Ueno, T.Yara, E.Miyamoto, Y.Uraoka, T.Kubota, S.Samukawa
    • Journal Title

      JpnJ.Appl.Phys 48

      Pages: 03B009

    • Peer Reviewed
  • [Journal Article] Experimental and Theoretical Analysis of Degradation in Ga2O3-In2O3-ZnO Thin-Film Transistors2009

    • Author(s)
      M.Fujii, Y.Uraoka, T.Fuyuki, J.S.Jung, J.Y.Kwon
    • Journal Title

      Jpn.J.Appl.Phys 48

      Pages: 04C091-1-6

    • Peer Reviewed
  • [Journal Article] Controlled Reduction of Bionanodots for Better Charge Strage Characteristics of Bionanodots Flash Mmeory2009

    • Author(s)
      Y.Tojo, A.Miura, Y.Uraoka, T.fuyuki, I.Yamashita
    • Journal Title

      Jpn.J.Appl.Phys 48

      Pages: 04C190-1-5

    • Peer Reviewed
  • [Journal Article] High-pressure water vapor heat treatment for enhancement of SiOx or SiNx passivation layers of silicon solar cells2009

    • Author(s)
      A.Ogane, A.Kitiyanan, Y.Uraoka, T.Fuyuki
    • Journal Title

      Jpn.J.Appl.Phys 48

      Pages: 066504

    • Peer Reviewed
  • [Journal Article] Comprehensive study of electroluminescence in multicrystalline silicon solar cells2009

    • Author(s)
      A.Kitiyanan, A.Ogane, A.Tani, T.Hatayama, H.Yano, Y.Uraoka, T.Fuyuki
    • Journal Title

      J.Appl.Phys 106

      Pages: 043717

    • Peer Reviewed
  • [Presentation] Location Controls of Crystallization Areas Utilizing Nickel Ferritins2010

    • Author(s)
      Y.Tojo, A.Miura, I.Yamashita, Y.Uraoka
    • Organizer
      International Thin-Film Transistor Conference 2010
    • Place of Presentation
      姫路市
    • Year and Date
      2010-01-28
  • [Presentation] Silicon Thin Film Transistor on Quartz Fiber2010

    • Author(s)
      Y.Sugawara, K.Yamazaki, T.Nakamura, H.Koaizawa, A.Mimura, K.Suzuki, Y.Uraoka
    • Organizer
      International Thin-Film Transistor Conference 2010
    • Place of Presentation
      姫路市
    • Year and Date
      2010-01-28
  • [Presentation] Scanning Probe Microscope Analysis for Electron Trapping and Detrapping in Defect Sites of Polycrystalline Silicon Thin Films2010

    • Author(s)
      E.Machida, Y.Uraoka, H.Ikenoue
    • Organizer
      International Thin-Film Transistor Conference 2010
    • Place of Presentation
      姫路市
    • Year and Date
      2010-01-28
  • [Presentation] Investigation of Low Temperature poly-Si TFT Flash Memory Using 3-Dimentonal Substrate2010

    • Author(s)
      K.Ichikawa, M.Matsue, H.Akamatsu, Y.Uraoka
    • Organizer
      International Thin-Film Transistor Conference 2010
    • Place of Presentation
      姫路市
    • Year and Date
      2010-01-28
  • [Presentation] Fabrication and Characterization of (Bax, Srl-x)Ta206 Thin Ffilms by Sol-Gel Method2010

    • Author(s)
      L.Lu, M.Echizen, T.Nishida, K.Uchiyama, Y.Uraoka
    • Organizer
      International Thin-Film Transistor Conference 2010
    • Place of Presentation
      姫路市
    • Year and Date
      2010-01-28
  • [Presentation] Electrical Properties of ZnO Thin Film Transistors Fabricated by Atomic Layer Deposition2010

    • Author(s)
      Y.Kawamura, Y.Uraoka
    • Organizer
      International Thin-Film Transistor Conference 2010
    • Place of Presentation
      姫路市
    • Year and Date
      2010-01-28
  • [Presentation] The Unique Phenomenon in IGZO TFTs Degradation under Dynamic Stress2010

    • Author(s)
      M.Fujii, T.Maruyama, M.Horita, K.Uchiyama, J.S.Jung, J.Y.Kwon, Y.Uraoka
    • Organizer
      International Thin-Film Transistor Conference 2010
    • Place of Presentation
      姫路市
    • Year and Date
      2010-01-28
  • [Presentation] Fabrication and Electric characteristics of proton-conductive Y-doped SrZrO_3 thin films by spin-coat technique2009

    • Author(s)
      Yuri.Isse, K.Uchiyama, T.Nishida, Y.Uraoka
    • Organizer
      19th MRS-Japan Academic Symposium
    • Place of Presentation
      Yokohama
    • Year and Date
      20091207-20091209
  • [Presentation] Effect of dielectric characteristics by Fine Patterning of Tunable waveguide on (Ba,Sr)TiO_3 Thin Films2009

    • Author(s)
      R.Onodera, T.Nishida, K.Uchiyama, Y.Uraoka
    • Organizer
      19th MRS-Japan Academic Symposium
    • Place of Presentation
      Yokohama
    • Year and Date
      20091207-20091209
  • [Presentation] Floating gate memory based on ferritin nanodots with high K gate dielectrics2009

    • Author(s)
      K.Ohara, I.Yamashita, Y.Uraoka
    • Organizer
      International Symposium on Advanced Nanostructures and Nano-Devices (ISANN) Kaanapali
    • Place of Presentation
      Hawaii
    • Year and Date
      20091130-20091204
  • [Presentation] Resistive random access memory utilizing ferritin protein with Pt nanodot2009

    • Author(s)
      M.Uenuma, K.Kawano, M.Horita, S.Yoshii, I.Yamashita, Y.Uraoka
    • Organizer
      International Symposium on Advanced Nanostructures and Nano-Devices (ISANN) Kaanapali
    • Place of Presentation
      Hawaii
    • Year and Date
      20091130-20091204
  • [Presentation] Behavior of Electron Trapping and Detrapping in Defect Sites of Polvcrvstalline Silicon Thin Films2009

    • Author(s)
      Emi Machida, Yukiharu Uraoka, Hiroshi Ikenoue
    • Organizer
      2009 MRS Fall Meeting
    • Place of Presentation
      Boston
    • Year and Date
      2009-12-10
  • [Presentation] ZnO Thin Film Transistors Fabricated by Atomic Layer Deposition Method2009

    • Author(s)
      Yumi Kawamura, Yukiharu Uraoka
    • Organizer
      2009 MRS Fall Meeting
    • Place of Presentation
      Boston
    • Year and Date
      2009-12-10
  • [Presentation] Electrical and Thermal Stress Analysis of InGaZnO Thin-Film Transistor2009

    • Author(s)
      Maori Fujii, Takashi Fuyuki, Ji Sim Jung, Jang Yeon Kwon, Yukiharu Uraoka
    • Organizer
      2009 MRS Fall Meeting
    • Place of Presentation
      Boston
    • Year and Date
      2009-12-10
  • [Presentation] Analysis and Improvement of Reliability in IGZO TFT for Next Generation Displays2009

    • Author(s)
      M.Fujii, T.Fuyuki, J.Jung, J.Kwon, Y.Uraoka
    • Organizer
      IMID 2009
    • Place of Presentation
      Seoul, Korea
    • Year and Date
      2009-11-06
  • [Presentation] Crystallization of amorphous Si by pulse annealing with Ni ferritin2009

    • Author(s)
      Y.Tojo, A.Miura, T.Fuyuki, I.Yamashita, Y.Uraoka
    • Organizer
      IMID 2009
    • Place of Presentation
      Seoul, Korea
    • Year and Date
      2009-11-06
  • [Presentation] Effect of post thermal annealing of ZnO-TFTs by atomic laver deposition2009

    • Author(s)
      K.Yumi, Y.Uraoka
    • Organizer
      Solid State Device Meeting
    • Place of Presentation
      Sendai
    • Year and Date
      2009-10-08
  • [Presentation] Thermally Robust Nanocrystal Memory with Co Bio-nanodot Self-assembled Monolayer as a Charge Trap Medium on Ultrathin LaAlO3 Layer2009

    • Author(s)
      S.Jung, K.Ohara, Y.Uraoka, T.Fuyuki, I.Yamashita, H.Hwang
    • Organizer
      Solid State Device Meeting
    • Place of Presentation
      Sendai
    • Year and Date
      2009-10-08
  • [Presentation] TFT-type Flash Memory with Biomineralized Nanodots on SOI Substrate2009

    • Author(s)
      K.Ohara, I.Yamashita, Y.Uraka
    • Organizer
      Solid State Device Meeting
    • Place of Presentation
      Sendai
    • Year and Date
      2009-10-08
  • [Presentation] Improvement of interface properties by NH3 pretreatment for 4H-SiC(000-1) MOS structure2009

    • Author(s)
      Y.Iwasaki, H.Yano, T.Hatayama, Y.Uraoka, T.Fuyuki
    • Organizer
      Solid State Device Meeting
    • Place of Presentation
      Sendai
    • Year and Date
      2009-10-08
  • [Presentation] Interface Properties of C-face 4H-SiC Metal-Oxide-Semiconductor Structures Prepared by Direct Oxidation in Nitric Oxide2009

    • Author(s)
      D.Okamoto, H.Yano, Y.Oshiro, T.Hatayama, Y.Uraoka, T.Fuvuki
    • Organizer
      Solid State Device Meeting
    • Place of Presentation
      Sendai
    • Year and Date
      2009-10-08
  • [Presentation] Local Electrical Properties of Poly-Si Thin Films2009

    • Author(s)
      Hiroshi Ikenoue, Emi Machida 1, Yukiharu Uraoka, Takeshi Ito, Ryohei Kokawa
    • Organizer
      AM-FPD '09
    • Place of Presentation
      Nara
    • Year and Date
      2009-07-06
  • [Presentation] Three-Dimensional Device Fabricated with Green Laser2009

    • Author(s)
      Takehiko Yamashita, Yuta Sugawara, Yukiharu Uraoka
    • Organizer
      AM-FPD '09
    • Place of Presentation
      Nara
    • Year and Date
      2009-07-06
  • [Presentation] Green Laser Anneling Crystallization for Three-Dimensional Device Application2009

    • Author(s)
      T.Yamashita, Y.Sugawara, Y.Uraoka, T.Fuyuki, M.Kimura
    • Organizer
      International Meeting for Future of Electron Devices, Kansai
    • Place of Presentation
      Osaka
    • Year and Date
      2009-05-14

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Published: 2011-06-16   Modified: 2016-04-21  

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