Growth of Ferromagnetic Silicide for Source/Drain Engineering

2008 Fiscal Year Self-evaluation Report

• Project/Area Number: 18063018
• Research Category: Grant-in-Aid for Scientific Research on Priority Areas
• Allocation Type: Single-year Grants
• Review Section: Science and Engineering
• Research Institution: Kyushu University
• Principal Investigator: MIYAO Masanobu Kyushu University, 大学院システム情報科学研究院, 教授 (60315132)
• Project Period (FY): 2006 – 2009
• Keywords: 電子デバイス・機器 / 集積回路 / スピントロニクス / シリコンゲルマニウム

Research Abstract

Si集積回路(Si-ULSI)が直面しているスケーリング限界の打破を目指して、SiGeヘテロ半導体をULSIに活用する研究が盛んに行われている。この様なヘテロ半導体に、「スピン機能」をも導入する事が出来れば、デバイス性能は飛躍的に向上し、21世紀のユビキタス情報通信に対応した未来型ULSIの創製が可能となる。我々はそのブレークスルーを、スピン偏極型強磁性シリサイドをソース(S)/ドレイン(D)としたスピントランジスタに求め、研究を行っている。

Research Products

• [Journal Article] Ferromagnetism and Electronic Structures of Nonstoichiometric Heusler-Alloy Fe3-xMnxSi Epilayers Grown on Ge(111) (2009)
  • Author(s): K. Hamaya, H. Itoh, O. Nakatsuka, K. Ueda, K. Yamamoto, M. Itakura, T. Taniyama, T. Ono, and M. Miyao
  • Journal Title: Phys. Rev. Lett. Vol.102, No.13 Pages: 13204-1-3
  • Peer Reviewed
• [Journal Article] Low- Temperature Molecular Beam Epitaxy of a Ferromagnetic Full-Heusler Alloy Fe2MnSi on Ge(111) (2008)
  • Author(s): K. Ueda, K. Hamaya, K. Yamamoto, Y. Ando, T. Sadoh, Y. Maeda, and M. Miyao
  • Journal Title: Appl. Phys. Lett. Vol.93, No.11 Pages: 112108-1-3
  • Peer Reviewed
• [Journal Article] Epitaxial Ferromagnetic Fe3Si/ Si(111) Structures with High-Quality Heterointerfaces (2008)
  • Author(s): K. Hamaya, K. Ueda, Y. Kishi, Y. Ando, T. Sadoh, and M. Miyao
  • Journal Title: Appl. Phys. Lett. Vol.93, No.13 Pages: 132117-1-3
  • Peer Reviewed
• [Journal Article] Atomically controlled hetero-epitaxy of Fe3Si/SiGe for spintronics application (2008)
  • Author(s): M. Miyao , K. Ueda, Y. Ando, M. Kumano, T. Sadoh, K. Narumi, Y. Maeda
  • Journal Title: Thin Solid Films Vol.517, No.1 Pages: 181-183
  • Peer Reviewed
• [Journal Article] Temperature dependent epitaxial growth of ferromagnetic silicide Fe3Si on Ge substrate (2008)
  • Author(s): K. Ueda, T. Sadoh, Y. Ando, T. Jonishi, K. Narumi, Y. Maeda, M. Miyao
  • Journal Title: Thin Solid Films Vol.517, No.1 Pages: 422-424
  • Peer Reviewed
• [Presentation] Atomically Controlled Epitaxial Growth of Ferromagnetic Heusler Alloys for Group-IV- Semiconductor Spintronic Applications (invited) (2008)
  • Author(s): M. Miyao, K. Hamaya, T. Sadoh, K. Ueda, Y. Ando, Y. Nozaki, K. Matsuyama, H. Itoh, and Y. Maeda
  • Organizer: IUMRS-ICA, ZI-4
  • Place of Presentation: Nagoya, Japan
  • Year and Date: 20081209-13
• [Presentation] Advanced Silicon Based Heterostructure Technologies for Future Devices (invited) (2007)
  • Author(s): M. Miyao
  • Organizer: The 21st Century COE
  • Place of Presentation: Osaka, Japan
  • Year and Date: 20071015-17
• [Presentation] RBS study of epitaxial growth of ferromagnetic Fe3Si on Ge (invited) (2007)
  • Author(s): Y. Ando, T. Jonishi, K. Narumi, K. Ueda, T. Sadoh, M. Miyao, and Y. Maeda
  • Organizer: European MRS 2007 Spring Meeting, B-13-1
  • Place of Presentation: Strasburg, France
  • Year and Date: 20070528-0601
• [Presentation] Atomically Controlled Hetero-Epitaxy of Fe3Si/SiGe for Spintronics Application (invited) (2007)
  • Author(s): M. Miyao, K. Ueda, M. Kumano, T. Sadoh, K. Narumi, Y. Andoh, and Y. Maeda
  • Organizer: ICSI-5, 5th International Conference on Silicon Epitaxy and Heterostructures, S7-I27
  • Place of Presentation: Marseille, France
  • Year and Date: 20070520-24
• [Presentation] Recent Progress in Low-Temperature Epitaxy of Silicon Based Heterostructures for Novel Devices (invited) (2007)
  • Author(s): M. Miyao, H. Kanno, K. Ueda and T. Sadoh
  • Organizer: 2007 MRS Spring Meeting, F8-3
  • Place of Presentation: San Francisco, USA
  • Year and Date: 20070409-13
• [Remarks] 第68回応用物理学会学術講演会(於 北海道工大)講演奨励賞受賞:安藤裕一郎,5p-Q-2,「Fe3SiGeヘテロエピタキシャル成長層の軸配向性の成長温度依存性の考察」
• [Remarks] 第54回応用物理学関係連合講演会(於 青山学院大学)講演奨励賞受賞:上田公二, 29a-P6-4,「Fe3Si/SiGeヘテロエピタキシャル成長に与える基板効果」