2007 Fiscal Year Final Research Report Summary
Fabrication of field emission and microdischarge devices using femtosemnd laser lithop-aphy
| Project/Area Number |
18360354
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Material processing/treatments
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| Research Institution | Osaka University |
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Principal Investigator |
HIRATA Yoshinori Osaka University, Graduate school of engineering, Professor (00116089)
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| Co-Investigator(Kenkyū-buntansha) |
NISHIYAMA Hiroaki Osaka University, Graduate school of engineering, Assistant professor (80403153)
MIYASAKA Fumikazu Osaka University, Graduate school ofengineering, Assistant professor (80304012)
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| Project Period (FY) |
2006 – 2007
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| Keywords | Field emission / Microdischarge / Miernelectrndes / Femtnsecnnd laser |
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| Research Abstract |
In this study, we fabricated field emission and micro-discharge devices using femtosecond laser lithography. The experimental results are as follows:
1. Femtosecond laser lithography
We proposed the combined process of femtosemnd laser-induced nonlinear lithography and etching processes. This process enables to fabricate microstructures onto nonpanar substrates, which is rather difficult for the conventional photolithography processes.
2. Space-selective growth of carbon nanotubes on a microelectrode tip
The patterns were formed on Au thin films by field emitted electron beams extracted from the microelectrode tips overall coated with carbon nanotubes. We investigated the effect of curvature radius, gap length between electrodes and applied voltages on the microfabrication of Au thin films by field emitted electron beams. The increases of curvature radius and applied voltages were effective for pattern formation by field emission, resulting in the patterns of 2μm diameters were created. Carbon nanotubes were space-selectively grown only on the top part of a microelectrode tip. The patterns of approximately 2μm diameters could be formed by using the microelectrodes with CNTs.
3. Arrayed microdischarge cavities
Arrays of hollow cathode microelectrode cavities were fabricated in Si wafers by semiconductor technology. The diameter of individual cavity was 30μm. Stable glow discharges were generated in atmospheric pressure of Ar gas. The patterns of 33 μm diameters were successfully formed on a resist thin film by using maskless microdischarge processes with O_2 and Ar mixed gas.
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[Journal Article] マイクロプラズマ生成用微細電極アレイの作製2008
Author(s)
伊庭知宏, 西山宏昭, 正森良輔, 溝尻瑞枝, 平田好則
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Journal Title
Proceedings of 14th Symposium on Micro-joining and Assembly Technology in Electronics Vol.14
Pages: 391-394
Description
「研究成果報告書概要(和文)」より
Peer Reviewed
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[Journal Article] Silica-based nonplanar structures by famtosecond laser lithography2007
Author(s)
M., Mizoshiri, H., Nishiyama, J., Nishii, T., Kawahara, T., Kawai, Y., Hirata
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Journal Title
Proceedings of 13th symposium on Micro-joining and Assembly Technology in Electronics Vol.13
Pages: 75-80
Description
「研究成果報告書概要(欧文)」より
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[Journal Article] Silica-based nonplanar structures fabricated by femtosecond laser lithography and plasma etching2007
Author(s)
M., Mizoshiri, H., Nishiyama, J., Nishii, T., Kawahara, T., Kawai, Y., Hirata
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Journal Title
Proceedings of 8th International Symposium on Laser Precision Microfabrication
Pages: 07-08
Description
「研究成果報告書概要(欧文)」より
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[Journal Article] Three-dimensional lithography using a self-trapped filament of femtosecond laser pulses2006
Author(s)
M., Mizoshiri, H., Nishiyama, Y., Hirata, J., Nishii, T., Kawahara, T., Kawai
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Journal Title
Proceedings of 41h International Congress on Laser Advanced Materials Processing
Pages: 06-85
Description
「研究成果報告書概要(欧文)」より
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[Presentation] Fabrication of Fabrication of silica-based surface structures by multiphoton lithography2007
Author(s)
H., Nishiyama, M., Mizoshiri, J., Nishii, T., Kawahara, T., Kawai, Y., Hirata
Organizer
The Spring meeting of The chemical society of Japan
Place of Presentation
Osaka
Year and Date
2007-03-26
Description
「研究成果報告書概要(欧文)」より
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[Presentation] フェムト秒レーザリソグラフィによるシリカガラス製非平面構造の作製2007
Author(s)
溝尻瑞枝, 西由宏昭, 西井準治, 河原敏男, 川合知二, 平田好則
Organizer
13th symposium on Microjoining and Assembly Technology in Electronics
Place of Presentation
パシフィコ横浜(神奈川県)
Year and Date
2007-02-01
Description
「研究成果報告書概要(和文)」より
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[Presentation] HirataHokkaido, "Silica-based nonplanar structures by femtosecond laser lithography"2007
Author(s)
M., Mizoshiri, H., Nishiyama, J., Nishii, T., Kawahara, T., Kawai, Y
Organizer
13th symposium on Microjoining and Assembly Technology in Electronics
Place of Presentation
Yokohama
Year and Date
2007-02-01
Description
「研究成果報告書概要(欧文)」より
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[Presentation] Microfabrication on three-dimensional structures by femtosecond laser lithography2006
Author(s)
M., Mizoshiri, H., Nishiyama, J., Nishii, T., Kawahara, T., Kawai, Y., Hirata
Organizer
The Autumn meeting of the Japan society of applied physics
Place of Presentation
Shiga
Year and Date
2006-08-30
Description
「研究成果報告書概要(欧文)」より
