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2007 Fiscal Year Final Research Report Summary

Investigation on Fatigue Strength of Nano/Micromatereials Subjected to Very High Cycle Fatigue

Research Project

Project/Area Number 18560095
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Materials/Mechanics of materials
Research InstitutionKochi National College of Technology

Principal Investigator

CHEN Qiang  Kochi National College of Technology, Dept of Mech. Eng., Associate Professor (30264451)

Co-Investigator(Kenkyū-buntansha) HASHIGUCHI Gen  Kagawa University, Faculty of Eng., Professor (70314903)
KAWAGOISHI Norio  Kagoshima University, Faculty of Eng., Professor (00117491)
Project Period (FY) 2006 – 2007
KeywordsFatigue / Nano / Micromaterials / Crack Initiation / Very High Cycle / Thin Film
Research Abstract

The application of silicon-based MEMS/NEMS has already resulted in significant improvements in our lives. Micromechanical components are routinely subjected to cyclic stresses at kilo- and megahertz frequencies, accumulating large numbers of stress cycles. To ensure performance and reliability of these tiny systems, fatigue mechanism must be elucidated to account for the timely and cyclically dependent degradation of the material at the size-scales of interest.
In the present study, fatigue strength and fracture mechanism of LP_CVD polycrystalline silicon thin films were investigated in the domain of 10^7-10^9 cycles by using a novel strain controlled, piezoelectric actuated free standing tensile fatigue system that can installed either within or outside a scanning electron microscope (SEM). Fatigue small crack behavior were observed and taped by CCD video camera. The following results were obtained and the possible mechanism was discussed.
A) The piezoelectric actuated tensile fatigue s … More ystem developed in the present study possesses a position sensor, which was fabricated by MEMS technology and can be used to monitor the movement of specimen center during cyclic loading.
B) The geometry design of the free standing tensile specimen was optimized with the help of commercial FEM software, ANSYS, in terms of the maximum stress available at the center beam of the specimen and the minimum out of plane displacement occurred accordingly.
C) It was fund that LP-CVD polycrystalline silicon thin films fatigued even at room temperature (~20℃) and at atmospheric environment (~26-35% of humidity). However, S-N diagram scattered tremendously, implying that the fatigue strength of the LP-CVD polycrystalline silicon thin films was quite sensitive to the difference in specimen morphology caused by micromachining as well as the deviation of humidity.
D) Specimens failed with little remarkable damage evolution that can be recognized by either an optical or an electron microscope. Furthermore, limited fractographic analysis assumes that fatigue nucleation and early growth are localized, and the other fracture morphologies are most brittle featured. In other words, the most of fatigue life was consumed in nucleating tiny cracks. Less

  • Research Products

    (14 results)

All 2009 2008 2007

All Presentation (14 results)

  • [Presentation] Develop of Very High Cycle Fatigue System for Nano/Micromaterials2009

    • Author(s)
      Q. Chen, G. Hashiguchi, N. Kawagoishi, K. Suzuki, K. Kusukawa, T. Sakai, M. Murai, K. Horibe
    • Organizer
      2007Annual Conference on Materials and Mechanics, Japan Society of Mechanical Engineers (M&M2007)
    • Place of Presentation
      Tokyo
    • Year and Date
      20091024-20091026
    • Description
      「研究成果報告書概要(欧文)」より
  • [Presentation] LP-CVDポリシリコン薄膜材の繰返し引張り疲労2009

    • Author(s)
      武智, 陳強, 楠川, 刈谷, 大平, 鈴木
    • Organizer
      日本機械学会中国四国支部第47期総会・講演会
    • Place of Presentation
      愛媛
    • Year and Date
      2009-03-06
    • Description
      「研究成果報告書概要(和文)」より
  • [Presentation] Fatigue Behavior of LP-CVD Polycrystalline Silicon Thin Film under Cyclic Tension2009

    • Author(s)
      K. Takechi, Q. Chen, K. Kusukawa, S. Kariya, M. Ohira, K. Suzuki
    • Organizer
      2009 Annual Meeting of Chukoku-shikoku Branch, Japan Society of Mechanical Engineers
    • Place of Presentation
      Ehime
    • Year and Date
      2009-03-06
    • Description
      「研究成果報告書概要(欧文)」より
  • [Presentation] 薄膜材料の引張疲労における応力解析2009

    • Author(s)
      吉村, 武智, 村井, 楠川, 仮谷, 陳
    • Organizer
      第14回高専シンポジウムin高知
    • Place of Presentation
      高知
    • Year and Date
      2009-01-24
    • Description
      「研究成果報告書概要(和文)」より
  • [Presentation] LP-CVDポリシリコン薄膜の疲労特性2009

    • Author(s)
      前田, 小松, 仮谷, 村井, 楠川, 陳
    • Organizer
      第14回高専シンポジウムin高知
    • Place of Presentation
      高知
    • Year and Date
      2009-01-24
    • Description
      「研究成果報告書概要(和文)」より
  • [Presentation] Fatigue Behavior of LP-CVD Polycrystalline Silicon Thin Film2009

    • Author(s)
      S. Maeda, H. Komatsu, S. Kariya, M. Murai, K. Kusukawa, Q. Chen
    • Organizer
      The 14^<th> Kosen Symposium in Kochi
    • Place of Presentation
      Kochi
    • Year and Date
      2009-01-24
    • Description
      「研究成果報告書概要(欧文)」より
  • [Presentation] Stress Analysis in Thin Film Materials under Tension Fatigue2009

    • Author(s)
      K. Yoshimura, K. Takechi, M. Murai, K. Kusukawa, S. Kariya, Q. Chen
    • Organizer
      The 14^<th> Kosen Symposium in Kochi
    • Place of Presentation
      Kochi
    • Year and Date
      2009-01-24
    • Description
      「研究成果報告書概要(欧文)」より
  • [Presentation] Fatigue Behavior in Polycrystalline Silicon Thin Film2008

    • Author(s)
      Q. Chen, G. Hashiguchi, N. Kawagoishi, K. Kusukawa, T. Suzuki, M. Murai
    • Organizer
      Abstracts of the 17th European Conference on Fracture (ECF-17)
    • Place of Presentation
      Brno, Czech
    • Year and Date
      20080902-20080905
    • Description
      「研究成果報告書概要(和文)」より
  • [Presentation] Fatigue Behavior in Polycrystalline Silicon Thin Film2008

    • Author(s)
      Q. Chen, G. Hashiguchi, N. Kawagoishi, K. Kusukawa, T. Suzuki, M. Murai
    • Organizer
      The 17th European Conference on Fracture (ECF-17)
    • Place of Presentation
      Brno, Czech
    • Year and Date
      20080902-20080905
    • Description
      「研究成果報告書概要(欧文)」より
  • [Presentation] Very High Cycle Fatigue Properties of LP-CVD Poly Si Films2007

    • Author(s)
      Q. Chen, G. Hashiguchi, K. Kusukawa, K. Suzuki, N. Kawagoishi, T. Sakai
    • Organizer
      MRS2007 Fall Meeting
    • Place of Presentation
      Boston, MA, USA
    • Year and Date
      20071126-20071130
    • Description
      「研究成果報告書概要(和文)」より
  • [Presentation] Very High Cycle Fatigue Properties of LP-CVD Poly Si Films2007

    • Author(s)
      Q. Chen, G. Hashiguchi, K. Kusukawa, K. Suzuki, N. Kawagoishi, T. Sakai
    • Organizer
      MRS 2007 Fall Meeting
    • Place of Presentation
      Boston, MA, USA
    • Year and Date
      20071126-20071130
    • Description
      「研究成果報告書概要(欧文)」より
  • [Presentation] ナノ・マイクロ材料の超高サイクル疲労信頼性試験装置の開発2007

    • Author(s)
      陳, 橋口, 皮寵石, 鈴木, 楠川, 酒井, 村井, 堀辺
    • Organizer
      日本機械学会(No. 07-3)材料力学カンファレンス
    • Place of Presentation
      東京
    • Year and Date
      20071024-20071026
    • Description
      「研究成果報告書概要(和文)」より
  • [Presentation] High Cycle Fatigue Crack Behavior and Fracture in poly Si thin films2007

    • Author(s)
      Q. Chen, G. Hashiguchi, Q. Y. Wang, N. Kawagoishi, K. Suzuki, Y. Nishimori
    • Organizer
      the Fourth International Conference on Very High Cycle Fatigue
    • Place of Presentation
      Michigan, MI, USA
    • Year and Date
      20070819-20070822
    • Description
      「研究成果報告書概要(和文)」より
  • [Presentation] High Cycle Fatigue Crack Behavior and Fracture in poly Si thin films2007

    • Author(s)
      Q. Chen, G. Hashiguchi, Q. Y. Wang, N. Kawagoishi, K. Suzuki, Y. Nishimori
    • Organizer
      The Fourth International Conference on Very High Cycle Fatigue (VHCF-4), Michigan
    • Place of Presentation
      Michigan, MI, USA
    • Year and Date
      20070819-20070822
    • Description
      「研究成果報告書概要(欧文)」より

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Published: 2010-06-09  

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