2007 Fiscal Year Final Research Report Summary
Development of continuous flowing high density plasma source in the atmospheric pressure?
| Project/Area Number |
18560268
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
電力工学・電気機器工学
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| Research Institution | Saitama University |
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Principal Investigator |
MAEYAMA Mitsuaki Saitama University, GRADUATE SCHOOL OF SCIENCE AND ENGINEERING, ASSOCIATE PROFESSOR (00196875)
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| Co-Investigator(Kenkyū-buntansha) |
KOBAYASHI Shinichi SAITAMA UNIVERSITY, GRADUATE SCHOOL OF SCIENCE AND ENGINEERING, PROFESSOR (40008876)
YAMANOU Yasushi SAITAMA UNIVERSITY, GRADUATE SCHOOL OF SCIENCE AND ENGINEERING, ASSISTANT PROFESSOR (30323380)
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| Project Period (FY) |
2006 – 2007
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| Keywords | Plasma / atmospheric pressure plasma / micro hollow cathode discharge / MHCD / MCS discharge / parallel MCS discharge / WIPS discharge |
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| Research Abstract |
The micro hollow cathode discharge (MHCD) is a promising one to generate a atmospheric pressure glow plasma. And, to produce 3-dimensional large volume and atmospheric pressure glow plasma, parallel operations of the micro-cathode sustained (MCS) discharge is required. In this study, we demonstrated parallel MCS discharges in flat plate and cylindrical geometries, as follow,
1: Demonstration of stable parallel MHCD Comparing current-voltage characteristics of MHCD of several dielectric materials (mica, Teflon, FR-4), MHCD electrode using FR-4 has a long lifetime and wide discharge current range over 100mA.2: Resolving operating conditions of parallel MCS discharge Injecting large amount of plasma from MHCD electrodes to MCS discharge region, the break down and the sustaining voltages of MCS discharge is demonstrated to be controlled by the current value of MHCD. And using these conditions, parallel MCS discharges of flat plate electrodes, furthermore cylindrical shaped electrode which suites well for the continuous gas treatment applications.
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