2019 Fiscal Year Final Research Report
Large area of 3D fabrication by atomic Moire using graphene and electron beam
Project/Area Number |
18K18811
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Research Category |
Grant-in-Aid for Challenging Research (Exploratory)
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Allocation Type | Multi-year Fund |
Review Section |
Medium-sized Section 18:Mechanics of materials, production engineering, design engineering, and related fields
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Research Institution | Osaka University |
Principal Investigator |
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Co-Investigator(Kenkyū-buntansha) |
高谷 裕浩 大阪大学, 工学研究科, 教授 (70243178)
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Project Period (FY) |
2018-06-29 – 2020-03-31
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Keywords | 3次元リソグラフィ / タルボット効果 / 高アスペクト比構造 / 機械学習 / ホログラフィ |
Outline of Final Research Achievements |
Recently, there has been considerable interest in fabrication methods of three-dimensional nano-periodic structures in a large area. Furthermore, there is also a need for a highly flexible method that can fabricate complex periodic or locally aperiodic structures. To meet these requirements, we propose a hologram-assisted and oblique incidence Talbot lithography. In order to control the shape of the structure by the proposed method, it is necessary to perform inverse calculation from the Talbot effect to incident light. In this project, we have developed two type 3D lithography by using convolutional neural network enabled inverse calculation to incident light of the diffraction grating from the light intensity distribution of the Talbot effect. The phase and intensity distribution of incident light can be predicted with high accuracy from the target Talbot effect. This inverse calculation method is expected as a technique for fabricating arbitrary complex periodic structures.
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Free Research Field |
光応用工学
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Academic Significance and Societal Importance of the Research Achievements |
本研究により,タルボット効果を利用した三次元リソグラフィの応用可能性が広がった.これまでは,主要構成光学系である回折格子の特性に加工形状が依存していたが,ホログラフィ技術と機械学習を併用することで任意分布制御が可能となった.また,高アスペクト比の構造は既存のリソグラフィ技術でも困難であったが,本手法を用いることで容易に大面積で形成することができるようになった.装置の価格などがボトルネックとなり使用者が限られていた微細加工技術が容易に応用展開できるようになった点で社会的意義が高く,この技術を応用することでバイオフィルタや光学スイッチングデバイスを構築できる.
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