2009 Fiscal Year Final Research Report
Elementary processes of photon, radical, and electron irradiation and their synergetic effects for plasma-surface interaction
| Project/Area Number |
19204056
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| Research Category |
Grant-in-Aid for Scientific Research (A)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Plasma science
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| Research Institution | Osaka University |
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Principal Investigator |
HAMAGUCHI Satoshi Osaka University, 大学院・工学研究科, 教授 (60301826)
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| Co-Investigator(Kenkyū-buntansha) |
YOSHIMURA Satoru 大阪大学, 工学研究科, 准教授 (40294029)
KITANO Katsuhisa 大阪大学, 工学研究科, 准教授 (20379118)
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| Co-Investigator(Renkei-kenkyūsha) |
SHIKATA Shinichi 独立行政法人産業技術総合研究所, ダイヤモンド研究センター, 副センター長 (00415689)
YAMADA Hideaki 独立行政法人産業技術総合研究所, ダイヤモンド研究センター, 研究員 (90443233)
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| Project Period (FY) |
2007 – 2009
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| Keywords | 反応性プラズマ / プラズマプロセス / 膜堆積 |
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| Research Abstract |
The goal of this research is to clarify the interactions between incoming species from the plasma and the surface material in a plasma process and their synergetic effects, i.e., nonlinear effects that cannot be accounted for by superposition of elementary reaction processes. In this study, it has been shown that, under certain conditions, effects of ultraviolet (UV) irradiation from the plasma on etching rates cannot be negligible and the conditions under which damages and relaxation processes caused by hydrogen injection affect the final states of the processed materials have been obtained. With these results, it has been clarified how energies and fluxes of hydrogen and UV irradiations need to be controlled for high-precision plasma processing.
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