2009 Fiscal Year Final Research Report
Fabrication of Electron Source with Electron-Wave Interference by Nano Beam Induced Deposition Process
| Project/Area Number |
19206008
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| Research Category |
Grant-in-Aid for Scientific Research (A)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Thin film/Surface and interfacial physical properties
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| Research Institution | Osaka University |
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Principal Investigator |
TAKAI Mikio Osaka University, 極限量子科学研究センター, 教授 (90142306)
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| Co-Investigator(Kenkyū-buntansha) |
WAKAYA FUJIO 大阪大学, 極限量子科学研究センター, 准教授 (60240454)
ABO Satoshi 大阪大学, 極限量子科学研究センター, 助教 (60379310)
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| Project Period (FY) |
2007 – 2010
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| Keywords | 電子波干渉 / 真空ナノエレクトロニクス / 電界電子放出電子源 / 電子のコヒーレント長 / 集束イオンビーム / 電子ビーム / ナノビーム / ビーム誘起堆積 |
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| Research Abstract |
Nanobeam deposition processes using focused ion or electron beams for Pt field emitters with nanometer adjacent electron emission sites have been developed to fabricate field emitters which emit coherent electrons with electron interference fringe patterns. Gated field emitters have further been developed to control fringe patterns at the lower voltages. The coherent length of conducting electrons in deposited Pt layers is also obtained and compared with the distance of adjacent electron emission sites in the Pt field emitter.
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[Journal Article] Transmission Electron Microscopy Observation of Pt Pillar Fabricated by Electron-Beam-Induced Deposition2009
Author(s)
Katsuhisa Murakami, Naoki Matsubara, Satoshi Ichikawa, Toshiya Kisa, Takahito Nakayama, Kunio Takamoto, Fujio Wakaya, Mikio Takai, Silke Petersen, Brigitte Amon, Heiner Ryssel
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Journal Title
Jpn J.of Appl.Phys. 48
Pages: 06FF12-1-06FF12-4
Peer Reviewed
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