PRODUCTION OF 3D-NANO-STRUCTURES BY MICRO-FABRICATION WITH DIRECT EXPOSURE OF HIGH-ENERGY ION BEAMS

2010 Fiscal Year Final Research Report

• Project/Area Number: 19206105
• Research Category: Grant-in-Aid for Scientific Research (A)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Nuclear engineering
• Research Institution: Japan Atomic Energy Agency
• Principal Investigator: KAMIYA Tomihiro Japan Atomic Energy Agency, 放射線高度利用施設部, 課長 (70370385)
• Co-Investigator(Kenkyū-buntansha): NISHIKAWA Hiroyuki 芝浦工業大学, 工学部, 教授 (40247226) ; SEKI Shuuhei 大阪大学, 大学院・工学研究科, 教授 (30273709) ; SUGIMOTO Masaki 独立行政法人日本原子力研究開発機構, 量子ビーム応用研究部門, 研究主幹 (90354943) ; ISHII Yasuyuki 独立行政法人日本原子力研究開発機構, 放射線高度利用施設部, 研究副主幹 (00343905) ; SATOH Takahiro 独立行政法人日本原子力研究開発機構, 放射線高度利用施設部, 研究副主幹 (10370404) ; OHKUBO Takeru 独立行政法人日本原子力研究開発機構, 放射線高度利用施設部, 研究職 (40446456) ; 芳賀 潤二 独立行政法人日本原子力研究開発機構, 放射線高度利用施設部, 出向職員 (00414566)
• Project Period (FY): 2007 – 2010
• Keywords: ナノデバイス / マイクロマシン / マイクロビーム / 3Dナノ構造創製 / マスクレ描画 / ナノ細線

Research Abstract

3D nano-fabrication technology making the best use of the feature of the high energetic ion microbeam of MeV or more was developed for the nano-device or the micro-machine production. In this study, various microbeam systems, which we previously developed to have the features of high spatial resolution, of high-density local energy deposition and of long range, were utilized to establish a maskless multi-exposure technique for the ion beam lithography. We obtained the prospect for the creation of three dimensional micro-structures including nano-wires.

Research Products

• [Journal Article] Fabrication of nanowires by varying energy microbeam lithography using heavy ions at the TIARA (2009)
  • Author(s): T.Kamiya, K.Takano, Y.Ishii, T.Satoh, M.Oikawa, T.Ohkubo, J.Haga, H.Nishikawa, Y.Furuta, N.Uchiya, S.Seki, M.Sugimoto
  • Journal Title: Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms 267 Pages: 2317-2320
  • Peer Reviewed
• [Journal Article] Microbeam complex at TIARA : Technologies to meet a wide range of applications
  • Author(s): T.Kamiya, K.Takano, T.Satoh, Y.Ishii, H.Nishikawa, S.Seki, M.Sugimoto, S.Okumura, M.Fukuda
  • Journal Title: Nucl.Instr.Meth. B(in press)
  • Peer Reviewed
• [Presentation] Local nano-processing of epoxy resin systems by single ion hits with writing (2010)
  • Author(s): K.Takano
  • Organizer: 12th International Conference on Nuclear Microprobe Technology and Applications (ICNMTA2010)
  • Place of Presentation: ドイツ、ライプチッヒ
  • Year and Date: 2010-07-29
• [Presentation] Curing Reaction of SU-8 Negative-type Photoresist by MeV Ion Beam Lithography (2010)
  • Author(s): K.Takano
  • Organizer: 27th International Conference of Photopolymer Science and Technology Conference (ICPST-27)
  • Place of Presentation: 千葉
  • Year and Date: 2010-06-24
• [Remarks] ホームページ等