2009 Fiscal Year Final Research Report
Construction of a method to perform large area patterning by dewetting
Project/Area Number |
19360021
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Research Category |
Grant-in-Aid for Scientific Research (B)
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Allocation Type | Single-year Grants |
Section | 一般 |
Research Field |
Thin film/Surface and interfacial physical properties
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Research Institution | Chitose Institute of Science and Technology |
Principal Investigator |
KARTHAUS Olaf Chitose Institute of Science and Technology, 総合光科学部, 教授 (80261353)
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Project Period (FY) |
2007 – 2009
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Keywords | 表面 / ディウェッティング |
Research Abstract |
we have successfully designed and fabricated a large area dewetting apparatus. We could show that it is possible to coat a large area substrate (30x40cm) homogeneously with polymer or low molar mass compounds, forming micronsize droplet or fiber arrays. Possible applications are microlens arrays or organic field effect transistor arrays.
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Research Products
(16 results)
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[Presentation] Solutions are the solution2010
Author(s)
O. Karthaus, K. Hidaka, K. Kai, K. Kon, K. Kubo, T. Meiling, K. Nakajima, K. Saiho, T. Wachi
Organizer
wet processing for patterning of organic and inorganic semiconductors, AsiaNano
Place of Presentation
Tokyo
Year and Date
20101101-20101103
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