2009 Fiscal Year Final Research Report
Passivation of semiconductor and metal surfaces with organic monolayers
| Project/Area Number |
19360024
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Thin film/Surface and interfacial physical properties
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| Research Institution | The Institute of Physical and Chemical Research |
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Principal Investigator |
YAMADA Taro The Institute of Physical and Chemical Research, 川合表面化学研究室, 専任研究員 (10174723)
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| Co-Investigator(Renkei-kenkyūsha) |
SUTO Shozo 東北大学, 大学院・理学研究科, 教授 (40171277)
NISHIYAMA Katsuhiko 熊本大学, 工学部, 准教授 (10202243)
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| Project Period (FY) |
2007 – 2009
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| Keywords | 有機単分子層 / 表面不動態化 / ナノテクノロジー / ケイ素ウエハ表面 / アルミニウム表面 / 赤外吸収スペクトル / 吸着種振動解析 / リン脂質単分子層 |
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| Research Abstract |
Since the first year of this research period, FY2007, we continued the experiments collaborating with Tohoku Univ., Kumamoto Univ. and Stanford Univ. (USA). In FY2007, we ordered the equipments, and the equipments were delivered in the end. In FY2008, we achieved quite a few basic findings, led by the finding on the driving force of "hydrophohicity" of modified Si aided by synchrotron radiation. As for passivation of aluminum surfaces, a substantial progress was made until FY2009. This technology has been filed for patent application. The development infrared spectroscopy, despite some difficulties in sample preparation, ended up with strong signals of ultrathin molecular layers (less than 1 nm thick), which has been found to be applicable for organic molecules, such as phospholipids, in aqueous solution.
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[Journal Article] Preparation and Characterization of Ultraclean H:Si(111)-(1×1) Surfaces Studied by HREELS, AFM and STM-STS2009
Author(s)
H. Kato, T. Taoka, S. Suto, S. Nishikata, G. Sazaki, K. Nakajima, T. Yamada, R. Czajka, A. Wawro, A. Kasuya
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Journal Title
e-Journal of Surface Science and Nano-Technology 7
Pages: 557-562
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[Journal Article] Preparation of an Ultra-clean and Atomically Controlled Hydrogen-terminated Si(111)-(1×1) Surface Revealed by HREELS, AFM and STM : Aqueous NH_4F Etching Process of Si(111)2007
Author(s)
H. Kato, T. Taoka, S. Nishikata, G. Sazaki, T. Yamada, R. Czajka, A. Wawro, K. Nakajima, A. Kasuya, S. Suto
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Journal Title
Jpn.J.Appl.Phys. 46
Pages: 5701-5705
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[Presentation] Preparation and Characterization of Ultra-clean H:Si(111)-(1×1) Surfaces Studied by HREELS, AFM and STM-STS2008
Author(s)
H. Kato, 田岡琢巳, S. Nishikata, G. Sazaki, 山田太郎, R. Czajka, A. Wawro, K. Nakajima, 粕谷厚生, S. Suto
Organizer
The 8th Japan-Russia Seminar on Semiconductor Surfaces
Place of Presentation
仙台市
Year and Date
2008-10-21
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