2009 Fiscal Year Final Research Report
Study on nanoscale chemical reaction for the establishment of scientific foundation of ultrafine patterning using extreme ultraviolet radiation
| Project/Area Number |
19360428
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Nuclear engineering
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| Research Institution | Osaka University |
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Principal Investigator |
KOZAWA Takahiro Osaka University, 産業科学研究所, 准教授 (20251374)
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| Co-Investigator(Kenkyū-buntansha) |
SAEKI Akinori 大阪大学, 産業科学研究所, 特別科学研究員 (10362625)
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| Project Period (FY) |
2007 – 2009
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| Keywords | 放射線 / X線 / 粒子線 / 半導体超微細化 / シミュレーション工学 / 計算物理 |
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| Research Abstract |
The reaction mechanism of resist pattern formation and the spatial distribution of reactive intermediates were clarified through the pulse radiolysis of model materials for the resists used for the mass-production of semiconductor devices. On the basis of the reaction mechanisms, a Monte Carlo simulation code was developed.
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[Journal Article] Effect of Polymer Protection and Film Thickness on Acid Generator Distribution in Chemically Amplified Resists2009
Author(s)
T. Fukuyama, T. Kozawa, H. Yamamoto, S. Tagawa, M. Irie, T. Mimura, T. Iwai, J. Onodera, I. Hirosawa, T. Koganesawa, K. Horie
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Journal Title
J. Photopolym. Sci. Technol 22巻
Pages: 105-109
Peer Reviewed
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[Journal Article] Effect of Molecular Structure on Depth Profile of Acid Generator Distribution in Chemically Amplified Resist Films2009
Author(s)
T. Fukuyama, T. Kozawa, K. Okamoto, S. Tagawa, M. Irie, T. Mimura, T. Iwai, J. Onodera, I. Hirosawa, T. Koganesawa, K. Horie
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Journal Title
Jpn. J. Appl. Phys 48巻
Pages: 06FC03
Peer Reviewed
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