2009 Fiscal Year Final Research Report
Researches on the atom lithography using the computer-generated holograms
| Project/Area Number |
19540414
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
原子・分子・量子エレクトロニクス・プラズマ
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| Research Institution | Saitama University |
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Principal Investigator |
OHMUKAI Ryuzo Saitama University, 教育学部, 准教授 (40359089)
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| Co-Investigator(Kenkyū-buntansha) |
KONDO Hitoshi 埼玉大学, 教育学部, 准教授 (40178421)
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| Project Period (FY) |
2007 – 2009
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| Keywords | 原子リソグラフィー |
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| Research Abstract |
We developed the fundamental techniques of atom lithography using the computer-generated holograms and the evanescent wave, which is a promising candidate for the novel nanofabrication. We improved the efficiency in generating the ultra-cold atoms for the atom source of lithography. We also developed the light source near a wavelength of 400nm with a violet laser diode. The frequency of the 780nm-light was stabilized less than 0.4MHz for 2 hours with the saturation signal of the rubidium atoms, which is applicable to stabilizing the optical mask in lithography.
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[Journal Article] The negative lens2008
Author(s)
Hitoshi Kondo, Masataka Hayakawa, Kunio. Ichiji, Ryuzo Ohmukai, Takamitsu Masuda, Toshinobu Tsuda
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Journal Title
Proceedings of the International Conference on Physics Education 2006, Journal of the Physics Education Society of Japan Supplement
Pages: 198-199
Peer Reviewed
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