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2009 Fiscal Year Final Research Report

Atomic-scale dielectric properties at the interface between Si and La-based oxides

Research Project

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Project/Area Number 19560020
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Thin film/Surface and interfacial physical properties
Research InstitutionThe University of Electro-Communications

Principal Investigator

NAKAMURA Jun  The University of Electro-Communications, 電気通信学部, 准教授 (50277836)

Project Period (FY) 2007 – 2009
Keywordsナノ材料 / 電子デバイス / 表面界面物性
Research Abstract

密度汎関数理論に基づく第一原理電子状態計算を用いて、La酸化物超薄膜単体およびLa酸化物とSi基板界面における原子レベル誘電特性、電子状態計算を行った。La酸化物表面においては、表面緩和により誘電率が著しく低下することがわかった。また、界面におけるバンドオフセットは、界面原子配列の詳細に大きく依存することがわかった。

  • Research Products

    (9 results)

All 2009 2008 2007 Other

All Journal Article (6 results) (of which Peer Reviewed: 5 results) Presentation (2 results) Remarks (1 results)

  • [Journal Article] n-plane strain effects on dielectric properties of the HfO2 thin film2009

    • Author(s)
      S. Wakui, J. Nakamura, A. Natori
    • Journal Title

      J. Vac. Sci. Technol. B 27

      Pages: 2020

    • Peer Reviewed
  • [Journal Article] Negative donors in bulk Si and Si/SiO2 quantum wells in a magnetic field2009

    • Author(s)
      J. Inoue, T. Chiba, A. Natori, J. Nakamura
    • Journal Title

      Phys. Rev. B 79

      Pages: 305206

    • Peer Reviewed
  • [Journal Article] Atomic scale dielectric constant near the SiO2/Si(001) interface2008

    • Author(s)
      S. Wakui, J. Nakamura, A. Natori
    • Journal Title

      J. Vac. Sci. Technol. B 26

      Pages: 1579

  • [Journal Article] Dielectric properties of the interface between Si and SiO22007

    • Author(s)
      S. Wakui, J. Nakamura, A. Natori
    • Journal Title

      Jpn. J. Appl. Phys. 46

      Pages: 3261

    • Peer Reviewed
  • [Journal Article] Nano-Scale Profile of the Dielectric Constant Near the Si/oxide Interface: A First-Principles Approach2007

    • Author(s)
      J. Nakamura, S. Wakui, S. Eguchi, R. Yanai, A. Natori
    • Journal Title

      ECS Trans. 11

      Pages: 273

    • Peer Reviewed
  • [Journal Article] Dielectric discontinuity at a twin boundary in Si(111)2007

    • Author(s)
      J. Nakamura, A. Natori
    • Journal Title

      Proc. 28th Int. Conf. Semi. Phys. 893

      Pages: 5

    • Peer Reviewed
  • [Presentation] Nano-scale profile of the dielectric constant near surfaces and interfaces: A first-principles approach2009

    • Author(s)
      J. Nakamura
    • Organizer
      2nd International Workshop on Epitaxial growth and Fundamental Properties of Semiconductor Nanostructures
    • Place of Presentation
      SemiconNano 2009(招待講演)
    • Year and Date
      2009-08-12
  • [Presentation] Nano-scale profile of the dielectric constant near the Si/Oxide interface: A first-principles approach2007

    • Author(s)
      J. Nakamura, S. Wakui, S. Eguchi, R. Yanai, A. Natori
    • Organizer
      212th Electrochemical society (ECS-212)
    • Place of Presentation
      Washington D.C., USA
    • Year and Date
      2007-10-09
  • [Remarks]

    • URL

      http://www.natori.ee.uec.ac.jp/junj/index-j.html

URL: 

Published: 2011-06-18   Modified: 2016-04-21  

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