2009 Fiscal Year Final Research Report
Study on fabrication techniques of high performance thin films for future ultrasonic and/or photonic devices
| Project/Area Number |
19560322
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Electronic materials/Electric materials
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| Research Institution | Kanagawa Institute of Technology |
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Principal Investigator |
UNO Takehiko Kanagawa Institute of Technology, 工学部, 教授 (50257408)
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| Co-Investigator(Kenkyū-buntansha) |
NOGE Satoru 沼津工業高等専門学校, 電気電子工学科, 准教授 (10221483)
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| Project Period (FY) |
2007 – 2009
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| Keywords | 機能性薄膜 / ルミネセンス / 誘導放出 / シリカガラス / 光増幅 / 圧電性 |
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| Research Abstract |
(1) Luminescence characteristics from silica glass thin films containing periodic doped impurities have been investigated. Capability of the films for optical amplification in short wavelength band around 400nm was clarified. Piezoelectricity similar to quartz crystal was observed in the films with periodic structure, however it almost disappeared after one year. (2) Growth technique of single crystal films of oxides on silica substrate was proposed. Signs of epitaxial growth of oxides on silica were observed. However, reproducibility was not so high. A temperature sensing technique during the crystallization process was developed to improve it.
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