Preparation of perovskite bismuth-based compound thin films by hot isostatic pressing

2008 Fiscal Year Final Research Report

• Project/Area Number: 19560736
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Material processing/treatments
• Research Institution: University of Hyogo
• Principal Investigator: KOBUNE Masafumi University of Hyogo, 大学院・工学研究科, 准教授 (90240960)
• Co-Investigator(Renkei-kenkyūsha): FUJISAWA Hironori 兵庫県立大学, 大学院・工学研究科, 准教授 (30285340)
• Project Period (FY): 2007 – 2008
• Keywords: 高圧アニール

Research Abstract

常温スパッタ法により(001)配向(Bi0.5La0.5)(Ni0.5Ti0.5)O3 [BLNT]結晶核上に非晶質BLNT膜を作製し、等方高圧アニール(HIP)法により至適に調整された酸素分圧下で結晶化を行い、結晶核と同方向の配向性とペロブスカイト構造をもつBLNT薄膜の作製に成功した。作製した膜の諸特性(構造及び電気特性)評価を行い、すぐれた強誘電体であることを実証した

Research Products

• [Journal Article] Structural characteris- tics and ferroelectric properties of bismuth-based compound thin films crystallized by hot isostatic press- ing (2009)
  • Author(s): M. Kobune, H. Tada, H. Oshima, D. Horii, A. Tamura, Y. Daiko, A. Mineshige and T. Yazawa
  • Journal Title: Key Engineering Materials (accepted)
  • Peer Reviewed
• [Journal Article] Fabrication and characterization of perovskite (Bi, Sm)(Ni, Ti)O_3 thin films by rf magnetron sputtering (2009)
  • Author(s): H. Tada, M. Kobune, K. Fukushima, H. Oshima, D. Horii, A. Tamura, Y. Daiko, A. Mineshige, T. Yazawa, H. Fujisawa, M. Shimizu, H. Yamaguchi and K. Honda
  • Journal Title: J. Korean Phys. Soc. (accepted)
  • Peer Reviewed
• [Journal Article] Formation mechanism in perovskite structure of (Bi, Ln)(Ni, Ti)O_3 thin films fabri- cated by rf magnetron sputtering (2009)
  • Author(s): H. Oshima, M. Kobune, H. Tada, K. Fukushima, D. Horii, A. Tamura, Y. Daiko, A. Mineshige, T. Yazawa, H. Yamaguchi and K. Honda
  • Journal Title: J. Korean Phys. Soc. (accepted)
  • Peer Reviewed
• [Presentation] Structural characteristics and ferroelectric properties of bis- muth-based compound thin films crys- tallized by hot isostatic pressing (2008)
  • Author(s): H. Tada, M. Kobune, K. Fukushima, H. Oshima, D. Horii, A. Mineshige, T. Yazawa
  • Organizer: Abstract book of the 6^<th> asian meeting on electroceramics(161)
  • Place of Presentation: Tsukuba, Japan
  • Year and Date: 20081022-28
• [Presentation] スパッタ法により作製した(Bi, Ln)- (Ni, Ti)O_3薄膜のペロブスカイト構造形成メカニズム (2008)
  • Author(s): 小舟正文、多田英人、大島尚士、堀井大輔、大幸裕介、嶺重温、矢澤哲夫
  • Organizer: 日本セラミックス協会第21回秋季シンポジウム講演予稿集(188)
  • Place of Presentation: 北九州国際会議場
  • Year and Date: 20080917-19
• [Presentation] Fabrication and characteriza- tion of perovskite (Bi, Sm)(Ni, Ti)O_3 thin films by rf magnetron sputtering (2008)
  • Author(s): H. Tada, M. Kobune, K. Fukushima, H. Oshima, D. Horii, A. Mineshige and T. Yazawa
  • Organizer: Abstract book of the 7^<th> Korea-Japan conference on ferroelectricity
  • Place of Presentation: Jeju, Korea
  • Year and Date: 20080806-09
• [Presentation] Formation mechanism in pero- vskite structure of (Bi, Ln)(Ni, Ti)O_3 thin films fabricated by rf magnetron sputtering (2008)
  • Author(s): H. Oshima, M. Kobune, K. Fukushima, H. Tada, D. Horii, A. Mineshige and T. Yazawa
  • Organizer: Abstract book of the 7^<th> Korea-Japan conference on ferroelec- tricity
  • Place of Presentation: Jeju, Korea
  • Year and Date: 20080806-09
• [Remarks]
  • URL: http://www.eng.u-hyogo.ac.jp/msc/msc5/info.html