2009 Fiscal Year Final Research Report
Development of biomaterials using plasma and ion processes
| Project/Area Number |
19760498
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| Research Category |
Grant-in-Aid for Young Scientists (B)
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| Allocation Type | Single-year Grants |
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| Research Field |
Structural/Functional materials
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| Research Institution | The Institute of Physical and Chemical Research |
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Principal Investigator |
KOBAYASHI Tomohiro The Institute of Physical and Chemical Research, 山崎原子物理研究室, 専任研究員 (40282496)
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| Project Period (FY) |
2007 – 2009
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| Keywords | プラズマイオン注入 / 細胞接着 / 生体適合性 / シリコーン / 炭素化 / PBII / PTFE |
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| Research Abstract |
In this study the surfaces of Silicones (polydimethylsiloxane) were irradiated with ions by a plasma based ion implantation (PBII) method and changes in their composition, structure, morphology and biocompatibility were investigated. Due to the morphological and the structural changes, the cell attachment percentage and growth rate were improved. The optimal irradiation voltage was between 2.5 and 5 kV. The Raman spectra showed a destruction of siloxane bonds and formation of amorphous carbon structures.
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