2021 Fiscal Year Final Research Report
Ultra-high-speed PVD technology based on sputtering for one-by-one processing
| Project/Area Number |
19H02051
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Review Section |
Basic Section 18040:Machine elements and tribology-related
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| Research Institution | Gifu University |
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Principal Investigator |
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| Project Period (FY) |
2019-04-01 – 2022-03-31
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| Keywords | PVD / 硬質薄膜 / 小ロット生産 / マグネトロンスパッタリング / HiPIMS / TiN |
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| Outline of Final Research Achievements |
In this study, we prototyped a device that performs MS (Magnetron Sputtering) on the outer surface of a rod-shaped substrate using magnetron discharge along the inner surface of the cylindrical target that surrounds the entire circumference of the substrate. We compared the case where the prototype device was driven in DC discharge mode (DCMS method) and the case where it was driven in high power impulse discharge mode (HiPIMS method). Specifically, a TiN film was formed in a nitrogen-containing atmosphere with a cylindrical target maed of Ti. Discharges with the same target voltage (-400 V) and average power density (3.66 W/cm2) were obtained by the DCMS and HiPIMS methods. We compared TiN films formed on the outer surface of steel rods (diameter 10 mm, length 80 mm).
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| Free Research Field |
プラズマ応用
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| Academic Significance and Societal Importance of the Research Achievements |
本研究はPVDコーティングの一個流し・小ロット生産への適用を目的とした．そのために必要な高速成膜化のための手段として，棒状基材の全周を包囲する円筒ターゲット内面に沿ったマグネトロン放電による，基材全周からのスパッタ成膜を考案した．このような基材包囲型MS(Magnetron Sputtering)装置による硬質膜堆積の事例はない．本研究は，基材包囲型MS(Magnetron Sputtering)装置の一個流し・小ロット生産への適用可能性と技術的課題を明らかにした．また，基材包囲型MS(Magnetron Sputtering)装置のHiPIMS駆動を学術的に明らかにした．
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