Developments of the forming techniques of hexagonal boron nitride films using tribo-chemical reactions

2021 Fiscal Year Final Research Report

• Project/Area Number: 19K04162
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Review Section: Basic Section 18040:Machine elements and tribology-related
• Research Institution: National Institute of Advanced Industrial Science and Technology
• Principal Investigator: Murakami Takashi 国立研究開発法人産業技術総合研究所, エレクトロニクス・製造領域, 主任研究員 (40344098)
• Project Period (FY): 2019-04-01 – 2022-03-31
• Keywords: トライボロジー / ホウ化物 / 高温 / 放電プラズマ焼結 / 窒化ホウ素

Outline of Final Research Achievements

Nowadays, new materials showing low friction and low wear rates at high temperatures have been explored in the high-temperature mold and thermal power generation industries. Recently, we clarified that MoB, which is one of the hard and low wear materials, showed low friction when sliding against Si3N4 at temperatures between 800 degree C and 1000 degree C in air. We considered that this low friction was due to the formation of low friction h-BN and MoO3 films on the worn surfaces. In this study, we explored low friction and low wear materials in the temperature range of room temperature to 1000 degree C in air. Besides we explored the forming method of high purity h-BN film. We found that ReB2 specimens showed low friction at room temperature, 800 degree C and 1000 degree C when sliding against Si3N4 balls in air. Also we found that high purity h-BN film was obtained by holding the SiB6 and Si3N4 specimens in Si3N4 and B4C powders, respectively, at 1500 degree C in a vacuum.

Free Research Field

トライボロジー

Academic Significance and Societal Importance of the Research Achievements

従来より高温用金型や火力発電、自動車、航空機などの業界で大気中室温～1000℃で連続して低摩擦・低摩耗を示す材料が求められてきているが、現在のところそのような材料は開発されていない。また六方晶窒化ホウ素は半導体であるため、深紫外線発光素子材料等への応用も期待されているが、現在の製造方法である気相合成法は毒劇物を使用するため環境負荷が大きい欠点がある。本研究で得られた低摩擦・低摩耗材料や六方晶窒化ホウ素の作製方法がさらに発展し、工業的に利用されるようになれば、そのインパクトは非常に大きいのではと考えている。