Development of chromatic aberration correction system for low voltage scanning electron microscope

2022 Fiscal Year Final Research Report

• Project/Area Number: 19K04489
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Review Section: Basic Section 21050:Electric and electronic materials-related
• Research Institution: Fukui University of Technology (2021-2022); Osaka University (2019-2020)
• Principal Investigator: Nishi Ryuji 福井工業大学, 工学部, 教授 (40243183)
• Project Period (FY): 2019-04-01 – 2023-03-31
• Keywords: 電子顕微鏡 / 収差補正 / 微分代数

Outline of Final Research Achievements

In scanning electron microscopy (SEM), the low energy electron beam used for observation results in relatively large chromatic aberration of the electron lens used, which reduces the resolution. To improve this chromatic aberration, the performance of an aberration corrector was investigated by simulation to find a more effective aberration corrector configuration. As a model for the aberration corrector, we used a new type of electromagnetic multipole, which is a development of the symmetric line current (SYLC).

Free Research Field

電子光学

Academic Significance and Societal Importance of the Research Achievements

電子顕微鏡の分解能を向上させる収差補正器の性能を高めるためには、その性能を表す収差係数（ボケの大小をあらわす指標）を効率的に求め、それらが小さくなるように収差補正器を構成する。微分代数という新しい数学的手法を用いたシミュレーションをSYLC収差補正器の計算およびプリズム光学系の計算に拡張し、特性を向上させた。走査電子顕微鏡の分解能の向上と必要な収差補正器のコスト低減が期待される。