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2011 Fiscal Year Final Research Report

Fabrication of ordered nano-and microstructures on semiconductors using self-organized materials and their applications

Research Project

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Project/Area Number 20241026
Research Category

Grant-in-Aid for Scientific Research (A)

Allocation TypeSingle-year Grants
Section一般
Research Field Nanomaterials/Nanobioscience
Research InstitutionKogakuin University

Principal Investigator

ONO Sachiko  工学院大学, 工学部, 教授 (90052886)

Co-Investigator(Kenkyū-buntansha) ASOH Hidetaka  工学院大学, 工学部, 准教授 (80338277)
Co-Investigator(Renkei-kenkyūsha) SUGII Yasuhiko  工学院大学, 付置研究所, 准教授 (90345108)
YASUKAWA Yukiko  工学院大学, 付置研究所, ポストドクター (10458995)
Project Period (FY) 2008 – 2011
Keywordsナノ材料 / ナノバイオ / 先端機能デバイス / 半導体超微細加工 / 材料加工・処理
Research Abstract

We developed novel fabrication techniques, which are not achievable by conventional lithography techniques based on the dry process, for semiconductors(Si, GaAs, and InP) and light metals(Al and Ti) to form ordered nano-and microstructures by wet process using the structural feature of spontaneously generated patterns.

  • Research Products

    (15 results)

All 2012 2011 2010 2009 2008 Other

All Journal Article (5 results) (of which Peer Reviewed: 5 results) Presentation (5 results) Book (2 results) Remarks (1 results) Patent(Industrial Property Rights) (2 results)

  • [Journal Article] Hexagonal geometric patterns formed by radial pore growth of InP based on Voronoi tessellation2012

    • Author(s)
      H. Asoh, J. Iwata, S. Ono
    • Journal Title

      Nanotechnology

      Volume: 23(21) Pages: 215304/1-215304/8

    • DOI

      DOI:10.1088/0957-4484/23/21/215304

    • Peer Reviewed
  • [Journal Article] High-aspect-ratio GaAs pores and pillars with triangular cross section2011

    • Author(s)
      H. Asoh, S. Kotaka and S. Ono
    • Journal Title

      Electrochemistry Communications

      Volume: 13(5) Pages: 458-461

    • DOI

      DOI:10.1016/j.elecom.2011.02.020

    • Peer Reviewed
  • [Journal Article] Site-Selective Anodic Etching of InP Substrate Using Self-Organized Spheres as Mask2010

    • Author(s)
      T. Yokoyama, H. Asoh and S. Ono
    • Journal Title

      Phys. Status Solidi A

      Volume: 207(4) Pages: 943-946

    • DOI

      DOI:10.1002/pssa.200925595

    • Peer Reviewed
  • [Journal Article] Site-Selective Metal Patterning/Metal-Assisted Chemical Etching on GaAs Substrate through Colloidal Crystal Templating2009

    • Author(s)
      Y. Yasukawa, H. Asoh and S. Ono
    • Journal Title

      J. Electrochemical Society

      Volume: 156(10) Pages: H777-H781

    • DOI

      DOI:10.1149/1.3187239

    • Peer Reviewed
  • [Journal Article] Ordered Hexagonal Array of Au Nanodots on Si Substrate Based on Colloidal Crystal Templating2008

    • Author(s)
      S. Sakamoto, L. Philippe, M. Bechelany, J. Michler, H. Asoh and S. Ono
    • Journal Title

      Nanotechnology

      Volume: 19 Pages: 405304/1-405304/6

    • DOI

      DOI:10.1088/0957-4484/19/40/405304

    • Peer Reviewed
  • [Presentation] High-aspect-ratio atructures of pore and pillar arrays of semiconductors fabricated by wet etching using sphere photolithography2012

    • Author(s)
      S. Ono, S. Kotaka, J. Iwata, K. Fujihara and H. Asoh
    • Organizer
      Porous Semiconductors-Science and Technology(PSST-2012)
    • Place of Presentation
      Malaga, Spain
    • Year and Date
      2012-03-29
  • [Presentation] Nano/Micro-Structured Semiconductors Fabricated by Anodic Etching using Sphere Photolithography2011

    • Author(s)
      S. Ono, S. Kotaka, J. Iwata and H. Asoh
    • Organizer
      220th Meeting of the Electrochemical Society
    • Place of Presentation
      Boston, USA
    • Year and Date
      20111009-14
  • [Presentation] Anodic etching of InP substrate through photoresist mask formed by sphere photolithography2011

    • Author(s)
      J. Iwata, H. Asoh and S. Ono
    • Organizer
      220th Meeting of the Electrochemical Society
    • Place of Presentation
      Boston, USA
    • Year and Date
      20111009-14
  • [Presentation] Micro-Patterning of Semiconductors by Metal-Assisted Chemical Etching through Self-Assembled Colloidal Spheres2009

    • Author(s)
      S. Ono and H. Asoh
    • Organizer
      215th Meeting of the Electrochemical Society
    • Place of Presentation
      San Francisco, USA
    • Year and Date
      2009-05-28
  • [Presentation] Patterning of Silicon by Metal-Assisted Chemical Etching/Electrodeposition Through Self-Organized Micro-Spheres2008

    • Author(s)
      S. Ono and H. Asoh
    • Organizer
      59th Annual Meeting of the International Society of Electrochemistry
    • Place of Presentation
      Seville, Spain
    • Year and Date
      2008-09-10
  • [Book] Nano/Micro-Patterning of Semiconductors using Noble Metal Particles as Catalyst for Site-Selective Chemical Etching2012

    • Author(s)
      S. Ono and H. Asoh
    • Total Pages
      225-248
    • Publisher
      InTech
  • [Book] Nanohole arrays on silicon, Handbook of Nanophysics : Functional Nanomaterials2010

    • Author(s)
      H. Asoh and S. Ono
    • Total Pages
      787
  • [Remarks] ホームページ(工学院大学小野研究室)

    • URL

      http://www.ns.kogakuin.ac.jp/~wwb1027/

  • [Patent(Industrial Property Rights)] 多孔質材料の製造方法2011

    • Inventor(s)
      小野幸子,阿相英孝,原口智,亀田常治,伊藤義康,新藤尊彦,早見徳介,久里裕二,窪谷悟
    • Industrial Property Rights Holder
      学校法人工学院大学,株式会社東芝
    • Patent Publication Number
      特許、特開2011-179103
    • Acquisition Date
      2011-09-15
  • [Patent(Industrial Property Rights)] エッチング特性に優れた電解コンデンサ電極用アルミニウム材の製造方法,アルミニウム電解コンデンサ用電極材ならびにアルミニウム電解コンデンサ2011

    • Inventor(s)
      小野幸子,阿相英孝,坂口雅司,山ノ井智明
    • Industrial Property Rights Holder
      小野幸子,昭和電工株式会社
    • Patent Publication Number
      特許、特開2011-63887
    • Acquisition Date
      2011-03-31

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Published: 2013-07-31  

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