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2010 Fiscal Year Final Research Report

Crystal Growth of nonpolar a-plane GaN on r-plane sapphire substrate and the application to high efficiency green light emitting diodes

Research Project

  • PDF
Project/Area Number 20360141
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionYamaguchi University

Principal Investigator

TADATOMO Kazuyuki  Yamaguchi University, 大学院・理工学研究科, 教授 (10379927)

Co-Investigator(Kenkyū-buntansha) KUWANO Noroyoki  九州大学, 産学連携センター, 教授 (50038022)
OKADA Narihito  山口大学, 大学院・理工学研究科, 助教 (70510684)
Project Period (FY) 2008 – 2010
KeywordsLED / 発光ダイオード / GaN / 無極性面 / 半極性面 / 結晶成長 / MOVPE
Research Abstract

The experimental crystal growth of a-plane GaN on r-plane sapphire substrate was carried out. Through this experiment, we have developed novel technology to grow semi-polar {11-22} plane GaN on the r-plane patterned sapphire substrate (r-PSS) with high quality and large diameter by metal-organic vapor phase epitaxy (MOVPE). We only use the basic and standard growth technology of c-plane GaN on the c-plane sapphire. Dislocation density of the {11-22} GaN is approximately 1×10^8cm(-2). The LED structure was fabricated on the {11-22} GaN template on the r-PSS. The blue-shift of the emission peak wavelength of the {11-22} LED as the increasing in injection current from 20mA to 100mA is smaller than that of c-plane LED.

  • Research Products

    (18 results)

All 2011 2010 2009 2008 Other

All Journal Article (5 results) (of which Peer Reviewed: 5 results) Presentation (9 results) Remarks (1 results) Patent(Industrial Property Rights) (3 results)

  • [Journal Article] Development of patterned sapphire substrate and the application to the growth of non-polar and semi-polar GaN for light-emitting diodes2011

    • Author(s)
      K.Tadatomo, N.Okada
    • Journal Title

      Proceedings of SPIE Vol.7954

      Pages: 795416-1-10

    • Peer Reviewed
  • [Journal Article] Growth Mechanism of Nonpolar and Semipolar GaN Layers from Sapphire Sidewalls on Various Maskless Patterned Sapphire Substrates2010

    • Author(s)
      N.Okada, H.Oshita, A.Kurisu, K.Tadatomo
    • Journal Title

      Japanese Journal of Applied Physics Vol.50

      Pages: 035602-1-7

    • Peer Reviewed
  • [Journal Article] Characterization of semipolar (11-22) GaN on c-plane sapphire sidewall of patterned r-plane sapphire substrate without SiO2 mask2010

    • Author(s)
      A.Kurisu, K.Murakami, Y.Abe, N.Okada, K.Tadatomo
    • Journal Title

      Physica Status Solidi (c) Vol.7

      Pages: 2059-2062

    • Peer Reviewed
  • [Journal Article] Growth of Semiconductor (11-22) GaN Layer by Controlling Anisotropic Growth Rates in r-Plane Patterned Sapphire Substrate2009

    • Author(s)
      N.Okada, A.Kurisu, K.Murakami, K.Tadatomo
    • Journal Title

      Applied Physics Express Vol.2

      Pages: 091001-1-3

    • Peer Reviewed
  • [Journal Article] Direct Growth of m-plane GaN with Epitaxial Lateral Overgrowth from c-plane Sidewall of a-plane Sapphire2008

    • Author(s)
      N.Okada, Y.Kawashima, K.Tadatomo
    • Journal Title

      Applied Physics Express Vol.1

      Pages: 111101-1-3

    • Peer Reviewed
  • [Presentation] Development of patterned sapphire substrate and the application to the growth of nonpolar and semipolar GaN for light-emitting diodes, Workshop on Frontier Photonics and Electronic Materials and Devices2011

    • Author(s)
      只友一行
    • Organizer
      2011 German-Japanese-Spanish Joint Workshop
    • Place of Presentation
      Granada, Spain.
    • Year and Date
      2011-03-17
  • [Presentation] Development of patterned sapphire substrate and the application to the growth of nonpolar and semipolar GaN for light-emitting diodes2011

    • Author(s)
      只友一行
    • Organizer
      SPIE Photonics West 2011
    • Place of Presentation
      San Francisco, USA.
    • Year and Date
      2011-01-27
  • [Presentation] サファイア加工基板を用いた非極性面GaN成長とその成長機構2010

    • Author(s)
      只友一行
    • Organizer
      第146回KASTECセミナー
    • Place of Presentation
      九州大学,福岡県
    • Year and Date
      2010-12-16
  • [Presentation] サファイア加工基板上の窒化物半導体成長2010

    • Author(s)
      只友一行
    • Organizer
      (財)科学技術交流財団分野別研究会LED応用研究会(第2回)
    • Place of Presentation
      名城大学,愛知県
    • Year and Date
      2010-10-19
  • [Presentation] Selective area growth of semipolar and nonpolar GaN from sapphire sidewall on patterned sapphire substrate using low-temperature GaN buffer layer2010

    • Author(s)
      H.Oshita
    • Organizer
      International Workshop on Nitride semiconductors (IWN2010)
    • Place of Presentation
      Tampa, Florida, USA.
    • Year and Date
      2010-09-23
  • [Presentation] サファイア基板の浅いエッチングによるGaNの選択成長2010

    • Author(s)
      古家大士
    • Organizer
      2010年秋季第71回応用物理学会関係連合学術講演会
    • Place of Presentation
      長崎大学,長崎県
    • Year and Date
      2010-09-15
  • [Presentation] テラス幅の広いr面サファイア加工基板を用いた{11-22}GaNの成長2010

    • Author(s)
      栗栖彰宏
    • Organizer
      2010年春季第57回応用物理学関係連合講演会
    • Place of Presentation
      東海大学,神奈川県
    • Year and Date
      2010-03-18
  • [Presentation] Epitaxial lateral overgrowth of semipolar (11-22) GaN from c-plane sapphire sidewall of patterned r-plane sapphire substrate without SiO_2 mask2009

    • Author(s)
      栗栖彰宏
    • Organizer
      The 8th International Conference on Nitride Semiconductors (ICNS-8)
    • Place of Presentation
      Jeju, Korea.
    • Year and Date
      2009-10-21
  • [Presentation] Direct growth of m-plane GaN on grooved-patterned a-plane sapphire substrate with SiO_2 mask2008

    • Author(s)
      N.Okada
    • Organizer
      International Workshop on Nitride Semiconductors (IWN 2008)
    • Place of Presentation
      Montreux, Switzerland.
    • Year and Date
      2008-10-06
  • [Remarks] ホームページ等

    • URL

      http://device.eee.yamaguchi-u.ac.jp/

  • [Patent(Industrial Property Rights)] 多波長発光素子及びその製造方法2011

    • Inventor(s)
      只友一行, 岡田成仁
    • Industrial Property Rights Holder
      国立大学法人 山口大学
    • Industrial Property Number
      特許権,特願2011-053393
    • Filing Date
      2011-03-10
  • [Patent(Industrial Property Rights)] 窒化ガリウム結晶積層基板及びその製造方法2011

    • Inventor(s)
      古家大士, 東正信, 只友一行, 岡田成仁
    • Industrial Property Rights Holder
      株式会社トクヤマ,国立大学法人山口大学
    • Industrial Property Number
      特許権,特願2011-049487
    • Filing Date
      2011-03-07
  • [Patent(Industrial Property Rights)] 半導体基板およびその製造方法2009

    • Inventor(s)
      只友一行, 岡田成仁
    • Industrial Property Rights Holder
      国立大学法人山口大学
    • Industrial Property Number
      特許権,PCT/JP2009/003960(国際特許出願),WO2010/023846(国際公開番号)
    • Filing Date
      2009-08-20

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Published: 2012-01-26   Modified: 2016-04-21  

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