2010 Fiscal Year Final Research Report
Plasma-Assist Effect on the Sputter-Deposition Process of Transparent Conductive Metal-doped Zinc Oxide Thin Films
| Project/Area Number |
20540485
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Plasma science
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| Research Institution | Nagasaki University |
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Principal Investigator |
MATSUDA Yoshinobu Nagasaki University, 工学部, 准教授 (60199817)
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| Project Period (FY) |
2008 – 2010
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| Keywords | スパッタリング / 誘導結合プラズマ / 透明導電膜 / 酸化亜鉛 / プレーナマグネトロン / 電気導電率 / 吸収分光 / 熱流束 |
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| Research Abstract |
Zinc oxide (ZnO) is an environmentally-friendly, low-cost and promising transparent conductive material to replace indium tin oxide (ITO) which has been widely-used so far. Inductively coupled plasma assisted magnetron sputtering has been applied for the deposition of transparent conductive aluminum-doped zinc oxide (AZO) thin films. Good quality AZO thin films with high transmittance and low resistivity have been successfully obtained by the assist with ICP.
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