2010 Fiscal Year Final Research Report
Advanced studies to functionalize the inner wall of microfluidic channels by atmospheric-pressure μplasmas
| Project/Area Number |
20540488
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Plasma science
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| Research Institution | Tsuruoka National College of Technology |
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Principal Investigator |
YOSHIKI Hiroyuki Tsuruoka National College of Technology, 総合科学科, 教授 (00300525)
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| Project Period (FY) |
2008 – 2010
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| Keywords | 大気圧μプラズマ / 磁化μプラズマ / マイクロ流路チップ / 小口径チューブ / 親水化処理 / プラズマCVD / TiO_2薄膜 / SiO_2薄膜 |
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| Research Abstract |
TiO_2 and SiO_2 thin films were prepared on the inner wall of narrow tubes or microchannels on a chip by μ plasma-enchanced chemical vapor deposition at low～atmospheric pressure. The chemical properties and surface morphology of the deposited films were analyzed by X-ray photoelectron spectroscopy, infrared spectroscopy and scanning electron microscopy. Magnetized He and Ar μ plasmas were generated inside the microchannels by applying a strong magnetic field of more than 0.4 T to control an electron temperature. Furthermore, a pulsed corona μ plasma was used to modify the surfaces of microchannel walls of commercial polymer microfluidic chips and the plasma-treated microchannels exhibited highly hydrophilic properties.
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