2010 Fiscal Year Final Research Report
on-Beam-Assisted Deposition of Hard cBN Films and Internal Stress Relaxation by Laminated layer
| Project/Area Number |
20560084
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Materials/Mechanics of materials
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| Research Institution | University of Hyogo |
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Principal Investigator |
UCHIDA Hitoshi University of Hyogo, 大学院・工学研究科, 教授 (30047633)
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| Co-Investigator(Renkei-kenkyūsha) |
YAMASHITA Masato 兵庫県立大学, 大学院・工学研究科, 准教授 (60291960)
HANAKI Satoshi 兵庫県立大学, 大学院・工学研究科, 准教授 (20336829)
NAKATANI Masanori 兵庫県立大学, 大学院・工学研究科, 助教 (80581553)
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| Research Collaborator |
LENG Bo 兵庫県立大学, 大学院・工学研究科, 院生
MUKOYAMA Kazutaka 兵庫県立大学, 大学院・工学研究科, 院生
UEYAMA Hiriki 兵庫県立大学, 大学院・工学研究科, 院生
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| Project Period (FY) |
2008 – 2010
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| Keywords | 機械材料 / 長寿命化 / 薄膜 / イオンビーム / 内部応力 |
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| Research Abstract |
Boron nitride (BN) films were prepared by depositing B vapor under simultaneous irradiation of N ions, that is ion mixing and vapor deposition technique. The effects of processing parameters on the internal stress of films were investigated. As a result, compressive internal stress increases at low acceleration voltage and high transport ratio B/N, of which the conditions correspond to those for formation of cubic BN phase. The hardness also becomes high at these conditions and there is a high negative correlation between internal stress and hardness of BN films. Especially, relaxation of internal stress without degradation of high hardness can be achieved when the crystal structure of inner layer is hexagonal BN.
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