2010 Fiscal Year Final Research Report
Development of plasma process equipment with pulsed plasma ablation technique
| Project/Area Number |
20560267
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Power engineering/Power conversion/Electric machinery
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| Research Institution | Nagoya Institute of Technology |
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Principal Investigator |
KIMURA Takashi Nagoya Institute of Technology, 大学院・工学研究科, 准教授 (60225042)
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| Project Period (FY) |
2008 – 2010
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| Keywords | アブレーション / パルスプラズマ / 材料プロセス / ダイヤモンドライクカーボン |
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| Research Abstract |
Thin amorphous carbon films are deposited on silicon substrates by exposure to pulsed plasmas where the feed gas is mainly generated from the ablation of an insulator. An electrothermal pulsed plasma thruster is used as the pulsed plasma for the ablation of the insulator, and the material of the insulator rod is polytetrafluoroethylene (PTFE). X-ray photoelectron spectroscopy is used in order to understand the elemental compositions of the deposited films. The measured spectra show that the fraction of fluorine F1s is larger than that of carbon C1s. In Raman spectra, two, very broad overlapping bands, which are attributed to the G (graphite) and D (disorder) peaks, are clearly observed. The maximum hardness measured by a nanoindenter is about 7 GPa. Therefore, the films should be regarded as fluorinated DLC films.
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