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2010 Fiscal Year Final Research Report

Development of high rate and low temperature sputter-deposition method for the fabrication of oxide films on organic substrate

Research Project

  • PDF
Project/Area Number 20560309
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionTokyo Polytechnic University

Principal Investigator

HOSHI Yoichi  Tokyo Polytechnic University, 工学部, 教授 (20108228)

Project Period (FY) 2008 – 2010
Keywordsスパッタリング / 薄膜プロセス / 低ダメージ成膜 / 有機EL / 透明導電膜
Research Abstract

In this study, we tried to clarify the mechanisms of the damages induced in the organic films(BAlq film) by the sputter-deposition of electrode TCO films, and developed a new damage-less sputter-deposition method for the formation of the electrode films in OLED. Results are summarized as follows;
1) Irradiation of high energy electrons and ions to the BAlq film above energy of 50 eV induced significant reduction of PL intensity of the films. This indicates that suppression of such high energy particle bombardment to the organic film surface during sputter-deposition is necessary to reduce the degradation of light emitting properties of the organic film.
2) It was confirmed that deposition of the electrode films by using a facing target sputtering(FTS) method instead of conventional magnetron sputtering was effective to reduce the damages in the organic films. But, it was found that small amount of high energy secondary electrons emitted from the end of the cathode target can arrive at the substrate surface in the FTS, and leads to a significant reduction of PL intensity of the organic film. Therefore, we achieved complete suppression of such high energy electron bombardment by the insertion of Al plate near the target electrode. In addition, reduction of the kinetic energy of the sputtered particles arrived at the substrate surface by increase in sputtering gas pressure above 8 mTorr, and/or use of Kr gas instead of Ar gas was effective to reduce the damages in the organic film.
Finally, we succeeded to develop a sputtering system in which incidence of secondary electrons and high energy sputtered particles to the substrate surface are completely suppressed during film deposition. As a result, sputter-deposition of the electrode films without reduction of PL intensity was successfully realized. Currently, we have been trying to make organic EL devices by using this new sputter-deposition process to confirm its usefulness in the EL device.

  • Research Products

    (23 results)

All 2010 2009 2008 Other

All Journal Article (18 results) Book (4 results) Remarks (1 results)

  • [Journal Article] High Rate Reactive Deposition of TiO_2 Films Using Two Sputtering Sources2010

    • Author(s)
      Yoichi Hoshi, Daiki Ishihara, Tetsuya Sakai, Osamu Kamiya, Hao Lei
    • Journal Title

      Vacuum 84

      Pages: 1377-1380

  • [Journal Article] Electron Bombardment Induced Damage to Organic Emission Layer.2010

    • Author(s)
      Hao Lei, Yoichi Hoshi, Meihan Wang, Takayuki Uchida, Shinichi Kobayashi, Yutaka Sawada
    • Journal Title

      Japanese Journal of Applied Physics. 49

      Pages: 042103

  • [Journal Article] Thermal change of organic light emitting Alq3 thin films2010

    • Author(s)
      M.H.Wang, T.Konya, M.Yahata, Y.Sawada, A.Kishi, T.Uchida, H.Lei, Y.Hoshi, L.X.Sun
    • Journal Title

      Journal of Thermal Analysis and Calorimetry Vol.99

      Pages: 117-122

  • [Journal Article] Photocatalytic Characteristics and Structure of TiO_2 Film Deposited by Oxygen-Ion-Assisted Reactive Evaporation at Low Temperature2010

    • Author(s)
      Tetsuya Sakai, Gho Ikegaya, Daiki Ishihara, Naonori Osada, Koji Kobayashi, Noriyuki Sato, Shohei Mochiduki, Yoichi Hoshi
    • Journal Title

      Japanese Journal of Applied Physics. Vol.49, No.1

      Pages: 015701

  • [Journal Article] High Rate Reactive Deposition of TiO_2 Films Using Two Sputtering Sources2010

    • Author(s)
      Yoichi Hoshi, Daiki Ishihara, Tetsuya Sakai, Osamu Kamiya, Hao Lei
    • Journal Title

      In press Vacuum

  • [Journal Article] Thermal crystallization kinetics and crystallite size distribution of amorphous ITO film deposited in the presence or absence of water vapor2010

    • Author(s)
      M.H.Wang, Y.Sawada, H.Lei, Y.Seki, Y.Hoshi, T.Uchida, T.Konya, A.Kishi
    • Journal Title

      Thin Solid Films 518,(11)

      Pages: 2992-2995

  • [Journal Article] The relationships between the film structure and photocatalytic characteristics of TiO_2 films deposited under oblique incidence by oxygen ion assisted reactive evaporation (OIARE) method2009

    • Author(s)
      Tetsuya Sakai, Noriyuki Sato, Syohei Mochiduki, Daiki Ishihara, Gho Ikegaya, Naonori Osada, Koji Kobayashi, Takeshi Maeda, Yoichi Hoshi
    • Journal Title

      Transactions of the Materials Research Society of Japan. Vol.34, No.1

      Pages: 97-100

  • [Journal Article] Thermodynamic Temperature and Density of Ar(I) for 4S'[1/2]0 State in a Facing Target Sputtering System2009

    • Author(s)
      Y. Yasuda, N. Nishimiya, Y.Hoshi, M.Suzuki
    • Journal Title

      ACTA PYSICA POLONICA A Vol.116

      Pages: 560-562

  • [Journal Article] Low Damage Sputter Deposition of ITO Films on Organic Light Emitting Films2009

    • Author(s)
      Hao Lei,Keisuke Ichikawa, Yoichi Hoshi, Meihan Wang, Yutaka Sawada, Takayuki Uchida
    • Journal Title

      Transactions of the Materials Research Society of Japan. Vol.34,(2)

      Pages: 321-324

  • [Journal Article] Study of Deposition of ITO films on Organic Layer using Facing Target Sputtering in Ar and Kr gases.2009

    • Author(s)
      Hao Lei, Keisuke Ichikawa, Yoichi Hoshi, Meihan Wang, Takayuki Uchida, Yutaka Sawada
    • Journal Title

      Thin Solid Films 516

      Pages: 5860-5863

  • [Journal Article] 有機EL素子用透明電極作製のための低ダメージスパッタ成膜法の開発2009

    • Author(s)
      星陽一、雷浩、小林信一、内田孝幸
    • Journal Title

      真空ジャーナル 5月号

      Pages: 11-15

  • [Journal Article] Investigation of Low Damage Sputter-Deposition of ITO Films on Organic Emission Layer.2008

    • Author(s)
      Hao Lei, Keisuke Ichikawa, Meihan Wang, Yoichi Hoshi, Takayuki Uchida, YutSawada
    • Journal Title

      IEIEC Tran.Electron. Vol.E.91-C, No.10

      Pages: 1658-1662

  • [Journal Article] High rate deposition of SiO_2 films using two sputtering sources.2008

    • Author(s)
      Y.Hoshi, K.Yagi, E.Suzuki, H.Lei, A.Sakai
    • Journal Title

      IEIEC Tran.Electron. Vol.E.91-C, No.10

      Pages: 1644-1648

  • [Journal Article] Photocatalytic characteristics TiO_2 films deposited by oxygen plasma-assisted reactive evaporation metod2008

    • Author(s)
      T.Sakai, Y.Kuniyoshi, W.Aoki, S.Ezoe, T.Endo, Y.Hoshi
    • Journal Title

      Japan.J.Appl.Phys. Vol.47, No.8

      Pages: 6548-6553

  • [Journal Article] High rate deposdityion of photocatalytic Tio2 films by oxygen plasma assit reactive evaporation method2008

    • Author(s)
      T.Sakai, Y.Kuniyoshi, W.Aoki, S.Ezoe, T.Endo, Y.Hoshi
    • Journal Title

      Thin Solid Films 516

      Pages: 5860-5863

  • [Journal Article] Transparent conductive film for top-emission organic light-emitting devices by low damage facing target sputtering2008

    • Author(s)
      Y.Onai, T.Uchida, Y.Kasahara, K.Ichikawa, Y.Hoshi
    • Journal Title

      Thin Solid Films 516

      Pages: 5911-5915

  • [Journal Article] Themal change of amorphous indium tin oxide films sputter-deposited in water vapor atmosphere2008

    • Author(s)
      M.Wang, Y.Onai, Y.Hoshi, T.Uchida, S.Singkarat, T.Kamwanna, S.Dangtip, S.Aukkaravittayapun, T.Nishide, S. Tokiwa, Y.Sawada
    • Journal Title

      Thin Solid Films 516

      Pages: 5809-5813

  • [Journal Article] Study of low power deposition of ITO for top emission OLED with facing target and R Fsputtering systems2008

    • Author(s)
      S.Dangtip, Y.Hoshi, Y.Kasahara, Y.Onai, T.Osotchan, Y.Sawada, T.Uchida
    • Journal Title

      J.Phys., Conference Series(042011) 100

      Pages: 1-6

  • [Book] スパッタ実務(Q&A集)2009

    • Publisher
      技術情報協会
  • [Book] 薄膜ハンドブック2008

    • Author(s)
      薄膜第131委員会編
    • Publisher
      オーム社
  • [Book] 薄膜の機械的物性と不良対策・高品質化2008

    • Publisher
      サイエンス&テクノロジー株式会社
  • [Book] 有機EL技術開発の最前線-高輝度・高精細・長寿命化・ノウハウ集-2008

    • Publisher
      技術情報協会
  • [Remarks] ホームページ

    • URL

      http://www.seit.t-kougei.ac.jp/ThinFILMLab/index.html

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Published: 2012-01-26   Modified: 2016-04-21  

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