2009 Fiscal Year Final Research Report
Development of stress measurement method using Raman spectroscopy and biaxial tensile testing for micro/nanoscale structures
Project/Area Number |
20760075
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Research Category |
Grant-in-Aid for Young Scientists (B)
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Allocation Type | Single-year Grants |
Research Field |
Materials/Mechanics of materials
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Research Institution | University of Hyogo |
Principal Investigator |
NAMAZU Takahiro University of Hyogo, 大学院・工学研究科, 准教授 (90347526)
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Project Period (FY) |
2008 – 2009
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Keywords | 応力 / 引張試験 / ラマン分光 / 単結晶Si |
Research Abstract |
We have designed and developed bi-axial tensile tester for film specimens, and obtained Raman spectra of micro/nanoscale single crystal silicon structures under uniaxial and biaxial stress states. As the results, Raman shift map around the Si structure under biaxial stress state was different from that under uniaxial stress state. By comparing Raman spectral parameters with stress components and its magnitude, we have confirmed that the parameters were correlated with stress components and magnitude. Integration of biaxial tensile testing with Raman spectroscopy enables us to precisely evaluate stress distribution of single crystal silicon structures in MEMS.
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Research Products
(5 results)
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[Presentation] Uniaxial Tensile Testing System for Quantitative Stress Analysis in Silicon Oxide Thin Films by Cathodoluminescence Spectroscopy2009
Author(s)
N. Goami, N. Yamashita, N. Araki, S. Kakinuma, K. Nishikata, N. Naka, K. Matsumoto, T. Namazu, S. Inoue
Organizer
The 2008 International Conference on Solid State Devices and Materials, SSDM 2009
Place of Presentation
Sendai, Japan
Year and Date
20090000
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