2009 Fiscal Year Final Research Report
Development of atmospheric-pressure plasma applied mist chemical vapor deposition and ZnO thin film growth under room temperature using the method.
| Project/Area Number |
20860081
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| Research Category |
Grant-in-Aid for Young Scientists (Start-up)
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| Allocation Type | Single-year Grants |
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| Research Field |
Applied materials science/Crystal engineering
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| Research Institution | Kochi University of Technology |
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Principal Investigator |
KAWAHARAMURA Toshiyuki Kochi University of Technology, ナノデバイス研究所, 助教 (00512021)
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| Project Period (FY) |
2008 – 2009
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| Keywords | ミスト化学気相成長(CVD)法 / 大気圧プラズマ / 薄膜成長 / 酸化亜鉛(ZnO) / ミスト液滴 / 機能薄膜 / 薄膜エッチング |
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| Research Abstract |
A novel low temperature thin-film fabricating method was created and developed using mist chemical vapor deposition with atmospheric-pressure plasma. In the development, the dynamics of the mist droplets at a reaction area were analyzed and the reaction of the mist rapidly proceeded with high reaction efficiency was revealed. Moreover, a novel etching technique using the mist was developed as a related technology. The developed methods can save the usages of chemical resources and total energy.
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