Fabrication of diffraction element approaching diffraction limit of electron wave

2022 Fiscal Year Final Research Report

• Project/Area Number: 20H02647
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Single-year Grants
• Section: 一般
• Review Section: Basic Section 30020:Optical engineering and photon science-related
• Research Institution: Tohoku University
• Principal Investigator: Sato Shunichi 東北大学, 多元物質科学研究所, 教授 (30162431)
• Project Period (FY): 2020-04-01 – 2023-03-31
• Keywords: レーザーナノ加工

Outline of Final Research Achievements

All matter has both particle and wave properties. Light is a typical example in which wave properties are most effectively utilized. Waves is known to diffract but modern optical technology has reached its diffraction limit. On the other hand, the development of technology for electron waves is still in progress, and the properties of electron waves have not been fully utilized. In this research, we have developed a fabrication technology to realize a diffraction element approaching the diffraction limit for electron waves. Specifically, we have succeeded in developing technology that enables nanoprocessing of thin films that allow most electrons to pass through.

Free Research Field

光工学

Academic Significance and Societal Importance of the Research Achievements

本研究では厚さが数10nmの自立した薄膜のレーザー加工を実現した。この厚さでは、ほとんどの電子が透過できるようになるため、回折素子としての効率が格段に向上することが期待できる。また、光の運動量は極めて小さいため、代表的なナノ加工法である集束イオンビームに較べると、加工ダメージが小さいという利点がある。さらに、加工は1パルスのレーザー照射だけで十分であり、原理的には1秒間に10000個以上の加工が可能となる。