2021 Fiscal Year Annual Research Report
Elucidation of plasma-assisted atomic layer etching (ALE) mechanism for magnetic materials using organic gas
| Project/Area Number |
20J10393
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| Research Institution | Osaka University |
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Principal Investigator |
YASSIN Abdulrahman Hikm 大阪大学, 工学研究科, 特別研究員(PD)
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| Project Period (FY) |
2020-04-24 – 2022-03-31
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| Keywords | Thermal ALE / DFT simulation / Etching of metals |
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| Outline of Annual Research Achievements |
The mechanisms of thermal atomic layer etching (ALE) for metals have been elucidated in this study. The chemical interaction of Beta-diketon, i.e., hexafluoroacetylacetone (hfacH), trifluoroacetylacetone (tfacH), and acetylacetone (acacH), with nickel (Ni) and nickel oxide (NiO) have been investigated. Then, the best etchant, which is hfacH molecules, have been nominated and examined with a magnesium oxide (MgO) surface and we could successfully generalize the investigated mechanism for all metals using density functional theory (DFT) simulation. Because of the pandemic COVID-19, I could not travel to Prof. Kessel lab in Eindhoven University of Technology (TU/e) to run some experiments. However, I will writing and publishing the remaining results during my new fellowship.
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| Research Progress Status |
令和3年度が最終年度であるため、記入しない。
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| Strategy for Future Research Activity |
令和3年度が最終年度であるため、記入しない。
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Research Products
(6 results)
