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2022 Fiscal Year Final Research Report

Physical Models of Temperature-dependent Resitivity and Hall Coefficient in Heavily Al-doped 4H-SiC

Research Project

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Project/Area Number 20K04565
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeMulti-year Fund
Section一般
Review Section Basic Section 21050:Electric and electronic materials-related
Research InstitutionOsaka Electro-Communication University

Principal Investigator

Matsuura Hideharu  大阪電気通信大学, 工学部, 教授 (60278588)

Project Period (FY) 2020-04-01 – 2023-03-31
Keywordsp型4H-SiC / IGBT / 高濃度Al添加4H-SiC / NNH伝導 / VRH伝導 / Hall係数 / Hall係数の符号反転
Outline of Final Research Achievements

In order to reduce the resistivity of the p-type 4H-SiC substrate (collector) of SiC n-channel IGBT, we investigated the conduction mechanism in highly Al doping. Although Al-doped 4H-SiC is a p-type semiconductor, it has been experimentally found that the Hall coefficient becomes negative (i.e., n-type semiconductors) in hopping conduction such as NNH conduction and VRH conduction in the low-temperature region. Therefore, we have proposed a physical model for the sign of the Hall coefficient in hopping conduction. Furthermore, we have proposed a physical model that elucidates that the activation energies of the resistivity and Hall coefficient in the NNH conduction region are almost equal.

Free Research Field

半導体工学

Academic Significance and Societal Importance of the Research Achievements

アモルファス半導体においては、伝導型(p型またはn型)とは反対のホール係数の符号(負または正)が現れることが知られていて、理論的検討が行われている。
一方、結晶半導体では高濃度p型半導体でのホッピング伝導領域では、ホール係数が負になるとの報告はほとんど無く、さらに理論的検討は行われていない。したがって、今回提案した物理モデルには学術的意義がある。さらに、ホッピング伝導領域での抵抗率の活性化エネルギーとホール効果の活性化エネルギーがほぼ等しくなることは、我々の報告だけである。したがって、その物理モデルを提案できたことは学術的意義がある。

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Published: 2024-01-30  

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