2022 Fiscal Year Annual Research Report
Elucidating the deposition and film formation mechanism of plasma-assisted aerosol deposition (PAD) process
| Project/Area Number |
20K05161
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| Research Institution | National Institute of Advanced Industrial Science and Technology |
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Principal Investigator |
山田 ムハマドシャヒン 国立研究開発法人産業技術総合研究所, エレクトロニクス・製造領域, 研究員 (90868746)
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| Project Period (FY) |
2020-04-01 – 2023-03-31
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| Keywords | Plasma assistance AD / Bonding mechanism / Single particle impact |
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| Outline of Annual Research Achievements |
Plasma assistance aerosol deposition (PAD) is a coating technology, the process is based on utilization of of plasma assistance for the fine particles under very high speed. However, it is difficult to understand the PAD bonding mechanism during coating formation due to the deposition of huge number of particles on the same time. In this project I investigate the adhesion phenomenon, bonding mechanism of the 1st single particle with the substrate via deposition of only single particle on the substrate by using multi-layer high speed shutter (to avoid the huge number of particles deposition). Followed by quantitative evaluation of the deposited particle Adhesion strength and peeling behavior. Microstructure observation of the cross-section of the deposited single particle
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