2011 Fiscal Year Final Research Report
Structure optimization of a field emitter with a built-in micro electrostatic lens
Project/Area Number |
21310083
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Research Category |
Grant-in-Aid for Scientific Research (B)
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Allocation Type | Single-year Grants |
Section | 一般 |
Research Field |
Microdevices/Nanodevices
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Research Institution | National Institute of Advanced Industrial Science and Technology |
Principal Investigator |
NAGAO Masayoshi 独立行政法人産業技術総合研究所, ナノエレクトロニクス研究部門, 主任研究員 (80357607)
|
Co-Investigator(Kenkyū-buntansha) |
YOSHIDA Tomoya (独)産業技術総合研究所, ナノエレクトロニクス研究部門, 研究員 (80462844)
|
Co-Investigator(Renkei-kenkyūsha) |
NEO Yoichiro 静岡大学, 電子工学研究所, 助教 (50312674)
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Project Period (FY) |
2009 – 2011
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Keywords | マイクロファブリケーション |
Research Abstract |
We proposed a field emitter with a built-in micro electrostatic lens, in which micron-sizsed field emitter and multi-stacked electrostatic lens are integrated on a silicon substrate, in order to achieve a tiny scanning electron microscope. We optimized and established the fabrication process by using ion irradiation technique, and so on. We also proposed new wehnelt electrode for obtaining strongly focused electron beam.
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