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2011 Fiscal Year Final Research Report

Pressure effect and its mechanism of interlayer coupling on the artificial lattice with semiconductor/ferromagnetic phaces of iron silicide.

Research Project

  • PDF
Project/Area Number 21560022
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Applied materials science/Crystal engineering
Research InstitutionFukuoka Institute of Technology

Principal Investigator

TAKEDA Kaoru  福岡工業大学, 工学部, 講師 (90236464)

Co-Investigator(Kenkyū-buntansha) NAKANISHI Takeshi  福岡工業大学, 工学部, 准教授 (70297761)
Co-Investigator(Renkei-kenkyūsha) YOSHITAKE Tsuyoshi  九州大学, 総合理工学研究科(研究院), 准教授 (40284541)
Project Period (FY) 2009 – 2011
Keywordsヘテロ構造 / 鉄シリサイド / 人工格子 / 静水圧力 / 電気抵抗率
Research Abstract

We present preliminary results of electrical resistivity measurements of Fe3Si/FeSi2 aetificial lattices under hydrostatic pressures up to 2.6GPa. The measurement have been performed on the Fe3Si single layer thin film and the[Fe3Si(25A)/FeSi2(7.5A)] 20 multilayer thin film with anti-ferromagnetically coupling among Fe3Si layers. For the Fe3Si single layer thin film, it is observed that the resistivity increases with increasing pressure, showing a tendency to saturate. On the other hand, it is found that the resistivity of the[Fe3Si(25A)/FeSi2(7.5A)]_<20> multilayer thin film increases monotonically with increasing pressure. The pressure effect of the resistivity for Fe3Si single layered thin film were less than+0.6%/GPa, and for FeSi2 single layered thin film, were less than+1.0%/GPa, and for the[Fe3Si(25A)/FeSi2(7.5A)] 0_<20> multilayer thin film with anti-ferromagnetically coupling, were less than+2%/GPa, and for ferromagnetocally coupling, were less than+1.0%/GPa.

  • Research Products

    (3 results)

All 2011 2010

All Journal Article (1 results) Presentation (2 results)

  • [Journal Article] Fe3Si/FeSi2人工格子の高圧下における電気抵抗率測定2011

    • Author(s)
      中西剛司、高崎理一、武田薫、堺研一郎、平川信一、園田貴之、吉武剛
    • Journal Title

      福岡工業大学エレクトロニクス研究所所報

      Volume: 第28巻 Pages: 1-4

  • [Presentation] Fe-Si系人工格子の高圧下における電気抵抗測定2010

    • Author(s)
      高崎理一
    • Organizer
      第116回日本物理学会九州支部例会
    • Place of Presentation
      長崎大学
    • Year and Date
      2010-12-04
  • [Presentation] Fe3Si/FeSi2人工格子の電気特性に及ぼす圧力効果2010

    • Author(s)
      高崎理一
    • Organizer
      平成22年度応用物理学会九州支部学術講演会
    • Place of Presentation
      九州大学
    • Year and Date
      2010-11-27

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Published: 2013-07-31  

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