2011 Fiscal Year Final Research Report
Study on highly efficient laser-plasma light source and its applications for microfabrication and textural control of materials
| Project/Area Number |
21560752
|
|---|
| Research Category |
Grant-in-Aid for Scientific Research (C)
|
| Allocation Type | Single-year Grants |
|---|
| Section | 一般 |
|---|
| Research Field |
Material processing/treatments
|
|---|
| Research Institution | University of Hyogo |
|---|
Principal Investigator |
MOCHIZUKI Takayasu 兵庫県立大学, 高度産業科学技術研究所, 特任教授 (80101278)
|
|---|
| Co-Investigator(Kenkyū-buntansha) |
MIYAMOTO Shuji 兵庫県立大学, 高度産業科学技術研究所, 教授 (90135757)
UTSUMI Uichi 兵庫県立大学, 高度産業科学技術研究所, 教授 (80326298)
AMANO Sho 兵庫県立大学, 高度産業科学技術研究所, 助教 (50271200)
|
|---|
| Project Period (FY) |
2009 – 2011
|
| Keywords | レーザープラズマ / 極端紫外光(EUV光) / プラズマデブリ / アルゴンガスバッファー |
|---|
| Research Abstract |
Plasma expansions on micro-balloon lithium targets irradiated with coaxial double pulses and counter-streamed simultaneous two-pulses were observed by a time-resolved EUV camera. The counter-streamed pulses were confirmed to be more effective for uniform heating of the target. A soft X-ray conversion efficiency in a wavelength range of 5-17 nm in a cryogenic xenon rotating target was 25%/2πsr at the maximum. An attenuation coefficient of sputtering by the debris and an absorption coefficient of soft x-rays at 13.5 nm by argon gas were derived to be 2.2×10^<20> m^2 and 1.8×10^<-22> m^2, respectively. The attenuation coefficient of sputtering is concluded to be equivalent to the effective collision cross section. These parameters provide a useful design tool for realizing a practical soft x-ray source.
|
