2010 Fiscal Year Final Research Report

Development of surface figure metrology system based on stitching interferometric method for hard x-ray nano-focusing mirrors

Research Project

Project/Area Number	21760106
Research Category	Grant-in-Aid for Young Scientists (B)
Allocation Type	Single-year Grants
Research Field	Production engineering/Processing studies
Research Institution	Japan Synchrotron Radiation Research Institute
Principal Investigator	YUMOTO Hirokatsu Japan Synchrotron Radiation Research Institute, 光学系部門, 研究員 (20423197)
Project Period (FY)	2009 – 2010
Keywords	表面形状計測 / X線ミラー / スティッチング干渉計 / X線光学素子 / X線ナノ集光
Research Abstract	In this study, we aimed at the realization of hard-x-ray nano-focusing beam using mirror optics. We developed a surface figure metrology system to measure nano-focusing mirror surface. We built a stitching interferometric system by using a white light microscopic interferometer. In this system, the microscopic interferometer measures local surface area of mirror surface, and at the same time, relative angle between local surface areas is measured by using another interferometer. This enables to measure entire mirror surface profile with an accuracy of a nanometer level.