2010 Fiscal Year Final Research Report

Study of new deposition method for the DLC thin film by using a pseudo-spark discharge CVD

Research Project

Project/Area Number	21760238
Research Category	Grant-in-Aid for Young Scientists (B)
Allocation Type	Single-year Grants
Research Field	Electronic materials/Electric materials
Research Institution	Hachinohe National College of Technology
Principal Investigator	KAMADA Takaharu Hachinohe National College of Technology, 電気情報工学科, 助教 (50435400)
Research Collaborator	FUJIWARA Tamiya 岩手大学, 工学部, 教授 (70042207)
Project Period (FY)	2009 – 2010
Keywords	擬火花放電 / プラズマジェット / イオン密度 / ダブルプローブ / DLC薄膜
Research Abstract	In this research, a new thin film deposition system is developed that a diamond-like carbon film is generated by using a pseudo-spark discharge plasma jet. This discharge is a large current discharge at low pressure region. It was found that plasma of high density (the order of 10^<20>m^<-3>) was spouted out within a radius of 50 mm of the center axis for the electrodes. The ion density of spouted plasma jet depends on the diameter of anode hole, distance between the electrodes, the discharge current and the rate of gas flow. But effect of the electromagnetic force can't confirm by discharge current as large as it isn't almost influenced by the discharge current in this experimental conditions. As a result of deposition experiment, it is succeeded that the thin film deposit on the silicon substrate.